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Industry News
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Nano Ceramic Vacuum Coating Machine
Nano ceramic vacuum coating machine is a state-of-the-art technology that uses a vacuum deposition process to coat thin layers of ceramic materials onto various substrates. This advanced coating method offers many benefits, including increased hardness, improved thermal stability, and superior we...Read more -
Several Common Target Materials
1. Chromium target Chromium as a sputtering film material is not only easy to combine with the substrate with high adhesion, but also chromium and oxide to generate CrO3 film, its mechanical properties, acid resistance, thermal stability are better. In addition, chromium in the incomplete oxidati...Read more -
Ion Beam Assisted Deposition Technology
1. Ion beam assisted deposition technology is characterized by strong adhesion between the membrane and the substrate, the membrane layer is very strong. Experiments show that: ion beam-assisted deposition of adhesion than the adhesion of thermal vapor deposition increased several times to hundre...Read more -
Reactive Sputtering Coating Characteristics and Applications
In the sputtering coating process, compounds can be used as targets for the preparation of chemically synthesized films. However, the composition of the film generated after sputtering of the target material often deviates greatly from the original composition of the target material, and therefor...Read more -
Metal Film Resistor Temperature Coefficient Characteristics
Metal film resistance temperature coefficient of resistance varies with film thickness, thin films are negative, thick films are positive, and thicker films are similar but not identical to bulk materials. In general, the resistance temperature coefficient of resistance changes from negative to p...Read more -
Ion Coating Characteristics and Application Chapter 2
③ High quality of the coating As ion bombardment can improve the density of the membrane, improve the organizational structure of the membrane, making the uniformity of the membrane layer is good, dense plating organization, fewer pinholes and bubbles, thus improving the quality of the membrane l...Read more -
Ion Coating Characteristics and Application-Chapter 1
Compared with evaporation plating and sputtering plating, the most important feature of ion plating is that the energetic ions bombard the substrate and the film layer while deposition takes place. The bombardment of charged ions produces a series of effects, mainly as follows. ① Membrane / base...Read more -
Special Magnetic Control Coating Equipment for Color Film
The special magnetron coating equipment for color film uses the power of magnetic field to accurately control the deposition of coating materials on the film substrate. This innovative technology enables unparalleled uniformity and consistency during the coating process, resulting in high-quality...Read more -
Watch Sputtering Coating Machine
The watch sputter coating machine uses the physical vapor deposition (PVD) process to apply a thin film of coating material to watch parts. The method provides excellent adhesion, uniform coverage and a variety of coating options including metallic, ceramic and diamond-like carbon. As a result, w...Read more -
Oxidation Resistant Film Coating Machine
The oxidation resistant film coating machine is a cutting-edge technology that provides a protective layer to prevent oxidation and improve the durability and longevity of metal components. This machine applies a thin film coating to the surface of materials, creating a barrier against corrosion ...Read more -
Integrated Lamp Protective Film Equipment
Incorporating advanced technology into modern lighting fixtures significantly improves their performance and efficiency. However, this also makes them more susceptible to damage from various external factors. Therefore, in order to protect these valuable assets and maximize their service life, th...Read more -
Target Selection And Classification
With the increasing development of sputtering coating, especially magnetron sputtering coating technology, at present, for any material can be prepared by ion bombardment target film, because the target is sputtered in the process of coating it to some kind of substrate, the quality of the measur...Read more -
Stainless Steel Plasma Coating Machine
In recent news, the demand for stainless steel products has been on the rise due to its superior corrosion resistance and modern aesthetic appeal. As a result, manufacturers are constantly seeking new and improved methods for coating stainless steel to meet the growing market demands. This is whe...Read more -
Faucet Gold Vacuum Coating Machine
The launch of the leading gold vacuum coating machine is a major development in the field of surface coating technology. Traditionally, the application of gold coatings is a complex and expensive process that requires specialized equipment and skilled technicians. However, this new machine promis...Read more -
Factors affecting film formation Chapter 2
(4) Target material. Target material is the key to sputtering coating, in general, as long as the target material meets the requirements, and strict control of the process parameters can be required to get the film layer. Impurities in the target material and surface oxides and other impure subst...Read more
