The equipment is a vertical double door structure. It is a composite equipment integrating DC magnetron sputtering coating technology, resistance evaporation coating technology, CVD coating technology and medium frequency ion cleaning system. It is suitable for customers’ complex product process switching. The metal film and protective film manufacturing process can be completed in the vacuum chamber at one time to prevent secondary process pollution.
1. The equipment has compact structure and small floor area.
2. Double door structure, no standby time, high production efficiency.
3. The coating film has good uniformity and high finish.
The equipment can be applied to different products such as lamps, vehicle logos and automotive interior trim parts, and can be coated with metal films, such as Ti, Cu, Al, Cr, Ni, SUS, Sn, In and other materials.
The equipment can be applied to different products such as lamps, vehicle logos and automotive interior trim parts, and can be coated with metal films, such as Ti, Cu, Al, Cr, Ni, SUS, Sn, In and other materials.
ZCM1417 |
φ1400*H1700(mm) |
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The equipment adopts the electron beam evaporation technology. Electrons are emitted from the cathode filament and focused into a certain beam current, which is accelerated by the potential between...
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The equipment adopts the electron beam evaporation technology. Electrons are emitted from the cathode filament and focused into a certain beam current, which is accelerated by the potential between...
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The equipment adopts the electron beam evaporation technology. Electrons are emitted from the cathode filament and focused into a certain beam current, which is accelerated by the potential between...
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The vacuum coating chamber of the chemical vapor deposition equipment adopts an independent double-layer water-cooling structure, which is efficient and uniform in cooling, and has a safe and stabl...
The equipment integrates magnetron sputtering and ion coating technology. According to different product requirements, heating system, bias system, ionization system and other devices can be select...
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