With the rapid growth of mobile phone industry demand, the loading capacity of traditional optical coating machine can not meet this demand. ZHENHUA has launched magnetron sputtering optical coating equipment to meet this demand.
Equipment features:
(1)The workpiece rack adopts cylindrical design, with large coating area. The product loading capacity is twice that of the electron beam evaporation equipment of the same specification. The workpieces rack is designed with revolution and rotation structure, which can adapt to workpieces of various shapes and is more widely used.
(2)Using the medium frequency magnetron cylindrical target sputtering system and the ion source auxiliary system, the coating film is compact, with high and stable refractive index, strong adhesion, and is not easy to adsorb water vapor molecules. In various environments, the film maintains more stable optical performance than the film deposited by the traditional electron beam evaporation equipment.
(3)Equipped with a crystal control monitoring system to accurately control the film thickness, the process has high stability and good repeatability. SPEEDFLO closed-loop and automatic control system can effectively improve the deposition rate of SiO2.
(4)The thermostatic fixture design can effectively control the product temperature, and can adapt to ultra-thin PET and PC products.
The equipment can be used to deposit TiO2, SiO2, Nb2O5, In, Ag, Cr and other materials, and can realize various optical color films, AR films, spectroscopic films, etc. It has been widely used in PET film / composite plate, mobile phone cover glass, mobile phone middle frame, 3C electronic products, sunglasses, perfume bottles, crystals and other products.
CFM1916 |
φ1900*H1600(mm) |
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
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The equipment integrates magnetron sputtering and ion coating technology, providing a solution for improving color consistency, deposition rate and stability of compound composition. According to d...
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The cathode of the equipment adopts the dual drive technology of front coil and permanent magnet superposition, and cooperates with the anode layer ion source etching system and three-dimensional m...
The equipment integrates magnetron sputtering and ion coating technology, and provides a solution for improving color consistency, deposition rate and stability of compound composition. According t...
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
The equipment integrates magnetron sputtering and ion coating technology, and provides a solution for improving color consistency, deposition rate and stability of compound composition. According t...
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
In the vacuum chamber, the coating material is vaporized and deposited on the substrate by using the resistance heating method, so that the surface of the substrate can obtain metal texture and ach...
The coating line adopts vertical modular structure design and is equipped with multiple access doors, which is convenient for independent installation and maintenance of the cavity, assembly and fu...
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
The equipment mainly adopts chemical vapor deposition to prepare oxide film, which has the characteristics of fast deposition rate and high film quality. As for the equipment structure, the double ...
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The coating line adopts vertical modular structure design and is equipped with multiple access doors, which is convenient for independent installation and maintenance of the cavity, assembly and fu...
The cathode of the equipment adopts the dual drive technology of front coil and permanent magnet superposition, and cooperates with the anode layer ion source etching system and three-dimensional m...
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The equipment is a vertical double door structure. It is a composite equipment integrating DC magnetron sputtering coating technology, resistance evaporation coating technology, CVD coating technol...
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
The large-scale metal anti fingerprint coating equipment is equipped with cathode arc ion coating system, medium frequency magnetron sputtering coating system and anti fingerprint coating system, w...
The vacuum coating chamber of the chemical vapor deposition equipment adopts an independent double-layer water-cooling structure, which is efficient and uniform in cooling, and has a safe and stabl...
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Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
The CF1914 equipment is equipped with medium frequency magnetron sputtering coating system + anode layer ion source + SPEEDFLO closed-loop control + crystal control monitoring system. The medium fr...
Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance. The RF high-frequency generator ca...
The equipment integrates magnetron sputtering and ion coating technology. According to different product requirements, heating system, bias system, ionization system and other devices can be select...
The cathode of the equipment adopts the dual drive technology of front coil and permanent magnet superposition, and cooperates with the anode layer ion source etching system and three-dimensional m...