Chemical Vapor Deposition (CVD) Fasaha fasaha ce ta samar da fina-finai wacce ke amfani da dumama, haɓaka plasma, taimakon hoto da sauran hanyoyi don yin abubuwan da ke haifar da iskar gas suna samar da ƙwararrun fina-finai a saman ƙasa ta hanyar halayen sinadarai a ƙarƙashin matsi na al'ada ko ƙasa.
Gabaɗaya, abin da mai amsawa shine gas kuma ɗayan samfuran yana da ƙarfi ana kiransa CVD reaction.Akwai nau'ikan sutura da yawa waɗanda CVD suka shirya, musamman a cikin tsarin semiconductor.Alal misali, a cikin filin semiconductor, tsaftace kayan aiki, shirye-shiryen fina-finai masu mahimmanci na semiconductor guda ɗaya, da kuma ci gaban fina-finai na polycrystalline da amorphous, daga na'urorin lantarki zuwa haɗakarwa, duk suna da alaƙa da fasahar CVD.Bugu da kari, da surface jiyya na kayan da aka fi so da mutane.Alal misali, daban-daban kayan kamar inji, reactor, Aerospace, likita da kuma sinadaran kayan aiki za a iya amfani da su shirya aikin coatings tare da lalata juriya, zafi juriya, sa juriya da surface ƙarfafa ta CVD film kafa hanya bisa ga daban-daban bukatun.
-- Guangdong Zhenhua, wani masana'anta ne ya buga wannan labarininjin shafa kayan aiki
Lokacin aikawa: Maris-04-2023