Vacuum magnetron sputtering ya dace musamman don rigunan sakawa mai amsawa.A gaskiya ma, wannan tsari zai iya ajiye fina-finai na bakin ciki na kowane kayan oxide, carbide, da nitride.Bugu da ƙari, tsarin yana da dacewa musamman don ƙaddamar da tsarin fina-finai na multilayer, ciki har da zane-zane na gani, fina-finai masu launi, sutura masu jurewa, nano-laminates, superlatice coatings, insulating fina-finai, da dai sauransu Kamar yadda farkon 1970, high quality Tantancewar fim. an ɓullo da misalan sakawa don nau'ikan kayan Layer na fim iri-iri.Wadannan kayan sun haɗa da kayan aiki na gaskiya, semiconductor, polymers, oxides, carbides, da nitrides, yayin da ake amfani da fluorides a cikin matakai irin su shafewa.
Babban fa'idar tsarin sputtering magnetron shine ta amfani da matakai masu amsawa ko marasa amsawa don saka yadudduka na waɗannan kayan da kulawa da abun da ke ciki na Layer, kauri na fim, daidaiton kauri na fim da kaddarorin inji na Layer.Tsarin yana da halaye kamar haka.
1. Babban adadin ajiya.Saboda yin amfani da high-gudun magnetron lantarki, babban ion kwarara za a iya samu, yadda ya kamata inganta Deposition kudi da sputtering kudi na wannan shafi tsari.Idan aka kwatanta da sauran sputtering shafi matakai, magnetron sputtering yana da wani babban iya aiki da kuma high yawan amfanin ƙasa, kuma ana amfani da ko'ina a daban-daban masana'antu samar.
2. Babban ƙarfin wutar lantarki.Maƙasudin sputtering Magnetron gabaɗaya zaɓi ƙarfin lantarki a cikin kewayon 200V-1000V, yawanci shine 600V, saboda ƙarfin lantarki na 600V yana cikin mafi girman kewayon ingancin wutar lantarki.
3. Low sputtering makamashi.Ana amfani da wutar lantarki mai nisa na magnetron ƙasa, kuma filin maganadisu yana iyakance plasma kusa da cathode, wanda ke hana manyan abubuwan da ke cajin kuzari daga ƙaddamarwa akan ma'aunin.
4. Low substrate zafin jiki.Ana iya amfani da anode don jagorantar kawar da electrons da aka samar yayin fitarwa, babu buƙatar tallafin substrate don kammalawa, wanda zai iya rage yawan bam ɗin lantarki na substrate yadda ya kamata.Don haka zafin jiki na ƙasa yana da ƙasa, wanda yake da kyau sosai ga wasu nau'ikan filastik waɗanda ba su da juriya sosai ga rufin zafin jiki.
5, Magnetron sputtering manufa surface etching ba uniform.Magnetron sputtering manufa etching saman da ba daidai ba ne ya haifar da rashin daidaito filin maganadisu na manufa.Wurin da aka yi niyya ya fi girma, ta yadda ingantaccen ƙimar amfani da manufa ya yi ƙasa (kawai kashi 20-30% na amfani).Sabili da haka, don inganta amfani da manufa, ana buƙatar canza rarraba filin maganadisu ta wasu hanyoyi, ko kuma amfani da maganadisu da ke motsawa a cikin cathode na iya inganta amfani da manufa.
6. Hadaddiyar manufa.Iya yin hadaddiyar manufa shafi gami fim.A halin yanzu, an sami nasarar lulluɓe yin amfani da ƙayyadaddun ƙayyadaddun tsarin sputtering magnetron akan Ta-Ti gami, (Tb-Dy) -Fe da Gb-Co gami da fim.Tsarin manufa mai hade yana da nau'i hudu, bi da bi, su ne maƙasudin maƙasudin zagaye, murabba'in maƙasudin murabba'i, ƙaramin murabba'in murabba'i da maƙasudin yanki.Amfani da sashin da aka shimfida tsarin manufa ya fi kyau.
7. Faɗin aikace-aikace.Magnetron sputtering tsari na iya ajiye abubuwa da yawa, na gama gari sune: Ag, Au, C, Co, Cu, Fe, Ge, Mo, Nb, Ni, Os, Cr, Pd, Pt, Re, Rh, Si, Ta, Ti , Zr, SiO, AlO, GaAs, U, W, SnO, da dai sauransu.
Magnetron sputtering yana daya daga cikin mafi yadu amfani shafi matakai don samun high quality fina-finai.Tare da sabon cathode, yana da babban amfani da manufa da ƙimar ajiya mai girma.Guangdong Zhenhua Technology injin magnetron sputtering shafi tsari yanzu yadu amfani a cikin shafi na manyan- area substrates.Ba a yi amfani da tsarin ba kawai don ƙaddamar da fim ɗin fim ɗaya kawai, amma har ma don murfin fim mai yawa, ƙari, ana amfani dashi a cikin jujjuya tsari don shirya fim ɗin, fim ɗin gani, lamination da sauran murfin fim.
Lokacin aikawa: Nuwamba-07-2022