Gabaɗaya halayen CVD sun dogara da yanayin zafi mai zafi, don haka ake kira thermally excited chemical vapor deposition (TCVD).Gabaɗaya yana amfani da precursors na inorganic kuma ana yinsa a cikin bangon bango mai zafi da sanyi mai sanyi.Hanyoyi masu zafi sun haɗa da dumama mitar rediyo (RF), dumama hasken infrared, dumama juriya, da sauransu.
Tushen sinadari mai zafi na bango
A haƙiƙa, bangon bangon bangon bangon injin tururin tururi shine tanderu mai zafi, yawanci mai zafi da abubuwa masu tsayayya, don samarwa na ɗan lokaci.Zane wurin samar da tururin sinadari mai zafi mai zafi don kayan aikin guntu ana nunawa kamar haka.Wannan tururin sinadari mai zafi na bango zai iya shafa TiN, TiC, TiCN da sauran siraran fina-finai.Za'a iya tsara reactor zuwa girman isa sannan kuma ya riƙe adadi mai yawa na abubuwan haɗin gwiwa, kuma ana iya sarrafa yanayin sosai don ajiya.Hoto na 1 yana nuna na'urar Layer epitaxial don silicon doping na samar da na'urar semiconductor.The substrate a cikin tanderun da aka sanya a cikin wani a tsaye shugabanci don rage da gurbatawa daga cikin deposition surface da barbashi, da kuma ƙwarai ƙara samar loading.Masu amfani da bangon zafi don samar da semiconductor yawanci ana sarrafa su a ƙananan matsi.
Lokacin aikawa: Nuwamba-08-2022