Hoʻopuka pōkole o ka ʻenehana chemical deposition (CVD).

ʻO ka ʻenehana Chemical Vapor Deposition (CVD) kahi ʻenehana hana kiʻiʻoniʻoni e hoʻohana ana i ka hoʻomehana, hoʻonui plasma, kōkua kiʻi a me nā mea ʻē aʻe e hana i nā mea kinoea e hana i nā kiʻiʻoniʻoni paʻa ma ka ʻili substrate ma o ka hopena kemika ma lalo o ke kaomi maʻamau a haʻahaʻa paha.

ʻO ka mea maʻamau, ʻo ka pane i loko o ka reactant he kinoea a ʻo kekahi o nā huahana he paʻa i kapa ʻia ʻo CVD reaction.Nui nā ʻano uhi i hoʻomākaukau ʻia e ka hopena CVD, ʻoi aku hoʻi i ke kaʻina semiconductor.No ka laʻana, ma ke kahua semiconductor, ʻo ka hoʻomaʻemaʻe ʻana i nā mea maka, ka hoʻomākaukau ʻana i nā kiʻi ʻoniʻoni kiʻi ʻoniʻoni semiconductor kiʻekiʻe, a me ka ulu ʻana o nā kiʻiʻoniʻoni polycrystalline a me amorphous, mai nā mea uila a hiki i nā kaʻa i hoʻohui ʻia, pili i ka ʻenehana CVD.Eia kekahi, makemake nui ʻia ka mālama ʻana i nā mea e nā kānaka.No ka laʻana, hiki ke hoʻohana ʻia nā mea like ʻole e like me ka mīkini, reactor, aerospace, nā lāʻau lapaʻau a me nā mea kemika e hoʻomākaukau ai i nā uhi hana me ka pale ʻana i ka corrosion, ka pale ʻana i ka wela, ka pale ʻana a me ka hoʻoikaika ʻana i ka ʻili e ka CVD film forming method e like me kā lākou mau koi like ʻole.

—— Ua paʻi ʻia kēia ʻatikala e Guangdong Zhenhua, kahi mea hanamea hoʻoheheʻe ʻia