Ka hoʻomohala ʻana i ka ʻenehana hoʻoheheʻe ʻia o ka lā

ʻO ka ʻaoʻao o ka hoʻomohala ʻana i ka ʻenehana ʻenehana silicon crystalline e pili pū ana i ka ʻenehana PERT a me ka ʻenehana Topcon, ua manaʻo ʻia kēia mau ʻenehana ʻelua ma ke ʻano he hoʻonui ʻia o ka ʻenehana cell diffusion method, ʻo kā lākou mau hiʻohiʻona maʻamau he papa passivation ma ka ʻaoʻao hope o ke kelepona, a hoʻohana ʻelua i kahi papa o doped poly silicon e like me ke kahua hope. Ua hoʻohana ʻia ʻo Tubular PECVD a me Tubular PECVD a me ka pā pālahalaha PECVD i ka hana nui nui o nā keʻena PERC.

He mana nui ko Tubular PECVD a hoʻohana maʻamau i ka mana haʻahaʻa haʻahaʻa o nā ʻumi o kHz. Hiki ke hoʻopilikia i ka maikaʻi o ka papa passivation i ka pōʻino Ion a me ka pale ʻana i nā pilikia plating. ʻAʻole i loaʻa i ka papa pālahalaha PECVD ka pilikia o ka pale ʻana i ka plating, a ʻoi aku ka maikaʻi o ka hoʻokō ʻana i ka uhi ʻana, a hiki ke hoʻohana ʻia no ka waiho ʻana o nā kiʻi Doped Si, Si0X, SiCX. ʻO ka hemahema ʻo ia ka nui o ka hydrogen i loko o ke kiʻi plated, maʻalahi e hana i ka blistering o ka papa kiʻiʻoniʻoni, kaupalena ʻia i ka mānoanoa o ka uhi. lpcvd uhi 'enehana me ka hoʻohana 'ana i ka pahu kapuahi uhi, me ka mana nui, hiki ke waiho mānoanoa polysilicon film, akā, ma laila e puni i ka plating hiki mai, i loko o ka lpcvd kaʻina hana ma hope o ka wehe 'ana a puni ka plating o ka papa kiʻiʻoniʻoni aʻaʻole e hōʻeha i ka lalo papa. Ua loaʻa i nā pūnaewele Topcon ka nui o ka hoʻololi ʻana o 23%.

——Ua hoʻokuʻu ʻia kēia ʻatikala emīkini hoʻoheheʻe ʻiaGuangdong Zhenhua