Hoʻomaka i ka waiho ʻana o ka mahu, ka sputtering a me ka uhi ʻana i ka ion

Hoʻokomo nui ʻia ka uhi ʻana i ka vacuum vapor deposition, sputtering coating a me ka ion coating, nā mea a pau i hoʻohana ʻia e waiho i nā ʻano metala a me nā kiʻi ʻoniʻoni ʻole ma luna o ka ʻili o nā ʻāpana plastik ma ka distillation a i ʻole ka sputtering ma lalo o nā kūlana vacuum, hiki ke loaʻa i kahi uhi ʻili lahilahi. me ka maikaʻi koʻikoʻi o ka hoʻopili wikiwiki ʻana, akā ʻoi aku ka kiʻekiʻe o ke kumukūʻai, a ʻoi aku ka liʻiliʻi o nā ʻano metala hiki ke hoʻohana ʻia, a hoʻohana mau ʻia no ka uhi hana o nā huahana kiʻekiʻe.

ʻO ka hoʻoheheʻe ʻana i ka mahu he ʻano hana e hoʻomehana ai i ka metala ma lalo o ka ʻūhā kiʻekiʻe, e hoʻoheheʻe, evaporate, a hana i kahi kiʻi ʻoniʻoni ʻoniʻoni ma ka ʻili o ka hāpana ma hope o ka hoʻoilo, me ka mānoanoa o 0.8-1.2 um.Hoʻopiha ia i ka concave liʻiliʻi a me nā ʻāpana convex ma luna o ka ʻili o ka huahana i hana ʻia e kiʻi i kahi aniani e like me ke aniani. pono e uhiia.

ʻO ka sputtering ka mea maʻamau i ka magnetron sputtering, ʻo ia ke ʻano o ka sputtering haʻahaʻa haʻahaʻa kiʻekiʻe.Pono ke kaʻina hana i kahi momi ma kahi o 1 × 10-3Torr, ʻo ia hoʻi ʻo 1.3 × 10-3Pa mokuʻāina piha i ka argon kinoea inert (Ar), a ma waena o ka substrate plastic (anode) a me ka pahu metala (cathode) me ka uila kiʻekiʻe. i kēia manawa, ma muli o ka excitation electron o ke kinoea inert i hana ʻia e ka hoʻokuʻu ʻana o ka glow, e hana ana i ka plasma, e puhi ka plasma i nā mana o ka pahu metala a waiho iā lākou ma ka substrate plastic.Hoʻohana ka hapa nui o nā pale metala maʻamau i ka sputtering DC, aʻo nā mea seramika non-conductive e hoʻohana i ka RF AC sputtering.

ʻO ka uhi ʻana o ka Ion he ʻano ia e hoʻohana ʻia ai ka hoʻokuʻu kinoea e hoʻokaʻawale i ke kinoea a i ʻole ka mea i hoʻoheheʻe ʻia ma lalo o nā kūlana ʻawaʻawa, a waiho ʻia ka mea i hoʻoheheʻe ʻia a i ʻole nā ​​​​mea hoʻoheheʻe ʻia ma luna o ka substrate ma o ka hoʻopā ʻana i nā ion kinoea a i ʻole nā ​​​​iona o ka mea i hoʻoheheʻe ʻia.Hoʻopili ʻia kēia mau mea me ka uhi ʻana o ka ion magnetron sputtering, ka uhi ion reactive, ka hollow cathode discharge ion coating (hollow cathode vapor deposition method), a me ka multi-arc ion coating (cathode arc ion coating).

ʻO ka magnetron ʻaoʻao ʻelua ʻaoʻao kū i ka uhi mau ʻana i ka laina
Hiki ke hoʻohana ʻia no nā huahana uila e like me ka puʻupuʻu puʻupuʻu EMI pale pale, nā huahana pālahalaha, a hiki ke hana ʻia nā huahana kīʻaha kukui āpau i loko o kahi kikoʻī kiʻekiʻe.Hiki ke hoʻouka nui, hoʻopaʻa paʻa a me ka hoʻopaʻa ʻana i nā kīʻaha māmā conical no ka uhi ʻaoʻao ʻelua, hiki ke loaʻa ka mana hoʻouka nui.ʻO ka maikaʻi paʻa, ke kūlike maikaʻi o ka papa kiʻiʻoniʻoni mai ka puʻupuʻu a i ka pūʻulu.ʻO ke kūlana kiʻekiʻe o ka automation a me ka uku hana haʻahaʻa.