ʻO ka hoʻoheheʻe ʻana i ka mahu mehana wela

ʻO ka maʻamau, hilinaʻi nā hopena CVD i nā wela kiʻekiʻe, no laila ua kapa ʻia ʻo thermally excited chemical vapor deposition (TCVD).Hoʻohana maʻamau ia i nā precursors inorganic a hana ʻia i loko o nā reactors pā wela a me nā pā anu.ʻO kāna mau ʻano wela e pili ana i ka hoʻomehana radio frequency (RF), ka hoʻomehana radiation infrared, ka hoʻomehana ʻana, a me nā mea ʻē aʻe.

Hoʻopaʻa mahu kemika pā wela
ʻOiaʻiʻo, ʻo ka mea hoʻoheheʻe hoʻoheheʻe kemika o ka paia wela he umu thermostatic, maʻa mau me nā mea pale pale, no ka hana ʻana.Hōʻike ʻia ke kaha kiʻi ʻana o kahi hale hana hoʻoheheʻe ʻana i ka mahu no ka uhi ʻana i nā mea hana chip.Hiki i kēia hoʻoheheʻe ʻana i ka mahu kemika wela ke uhi iā TiN, TiC, TiCN a me nā kiʻi ʻoniʻoni ʻoniʻoni ʻē aʻe.Hiki ke hoʻolālā ʻia ka reactor i ka nui a laila paʻa i ka nui o nā ʻāpana, a hiki ke hoʻomalu pono ʻia nā kūlana no ka waiho ʻana.Hōʻike ka Pic 1 i kahi mea papa epitaxial no ka doping silika o ka hana semiconductor.Hoʻokomo ʻia ka substrate i loko o ka umu ahi i kahi ʻaoʻao kū e hōʻemi i ka contamination o ka ʻili deposition e nā ʻāpana, a hoʻonui nui i ka hoʻouka ʻana.Hoʻohana mau ʻia nā reactors pā wela no ka hana semiconductor i nā haʻahaʻa haʻahaʻa.