① Zoo controllability thiab repeatability ntawm zaj duab xis thickness
Seb cov yeeb yaj kiab thickness tuaj yeem tswj tau ntawm tus nqi predetermined yog hu ua zaj duab xis thickness controllability.Qhov xav tau zaj duab xis tuab tuaj yeem rov ua dua rau ntau zaus, uas yog hu ua zaj duab xis thickness repeatability.Vim tias qhov tso tawm tam sim no thiab lub hom phiaj tam sim no ntawm lub tshuab nqus tsev sputtering txheej tuaj yeem tswj tau nyias.Yog li ntawd, lub thickness ntawm sputtered zaj duab xis yog tswj tau, thiab cov zaj duab xis nrog predetermined thickness tuaj yeem tso siab tau.Tsis tas li ntawd, lub sputter txheej tuaj yeem tau txais ib zaj duab xis nrog cov tuab tuab ntawm qhov loj.
② Muaj zog adhesion ntawm zaj duab xis thiab substrate
Lub zog ntawm sputtered atoms yog 1-2 qhov kev txiav txim siab ntau dua li ntawm evaporated atoms.Lub zog hloov dua siab tshiab ntawm lub zog siab sputtered atoms tso rau ntawm lub substrate yog ntau dua li ntawm cov evaporated atoms, uas ua rau muaj cua sov ntau dua thiab txhim kho qhov adhesion ntawm sputtered atoms thiab substrate.Tsis tas li ntawd, qee qhov muaj zog sputtered atoms tsim cov qib sib txawv ntawm kev txhaj tshuaj, tsim ib txheej pseudodiffusion ntawm substrate.Tsis tas li ntawd, lub substrate yog ib txwm ntxuav thiab qhib rau hauv thaj av plasma thaum lub sij hawm tsim cov zaj duab xis, uas tshem tawm cov sputtering atoms nrog qaug zog adhesion, thiab purifies thiab activates lub substrate nto.Yog li ntawd, cov zaj duab xis sputtered muaj zog adhesion rau lub substrate.
③ Cov ntaub ntawv tshiab cov yeeb yaj kiab txawv ntawm lub hom phiaj tuaj yeem npaj tau
Yog tias cov roj reactive tau qhia thaum lub sij hawm sputtering kom nws hnov mob nrog lub hom phiaj, cov khoom siv tshiab cov yeeb yaj kiab txawv ntawm lub hom phiaj tuaj yeem tau txais.Piv txwv li, silicon yog siv los ua lub hom phiaj sputtering, thiab cov pa oxygen thiab argon muab tso rau hauv lub tshuab nqus tsev ua ke.Tom qab sputtering, SiOz insulating zaj duab xis tuaj yeem tau txais.Siv titanium raws li lub hom phiaj sputtering, nitrogen thiab argon muab tso rau hauv lub tshuab nqus tsev chamber ua ke, thiab theem TiN kub zoo li zaj duab xis tuaj yeem tau txais tom qab sputtering.
④ High purity thiab zoo ntawm zaj duab xis
Txij li thaum tsis muaj cov khoom siv crucible nyob rau hauv sputtering zaj duab xis npaj ntaus ntawv, cov khoom ntawm cov khoom siv hluav taws xob hluav taws xob yuav tsis sib xyaw rau hauv sputtering zaj duab xis txheej.Qhov tsis zoo ntawm sputtering txheej yog tias zaj duab xis tsim nrawm nrawm dua li cov txheej txheej ntawm evaporation, qhov kub ntawm lub substrate yog siab dua, nws yooj yim rau kev cuam tshuam los ntawm impurity gas, thiab cov cuab yeej qauv yog complex.
Kab lus no yog luam tawm los ntawm Guangdong Zhenhua, lub chaw tsim khoom ntawmtshuab nqus tsev txheej
Post lub sij hawm: Mar-09-2023