1. Tus nqi evaporation yuav cuam tshuam rau cov khoom ntawm evaporated txheej
Tus nqi evaporation muaj qhov cuam tshuam zoo rau cov yeeb yaj kiab tso.Vim hais tias cov txheej txheem txheej tsim los ntawm qhov qis deposition yog xoob thiab yooj yim los tsim loj particle deposition, nws muaj kev nyab xeeb heev rau xaiv ib tug ntau dua evaporation tus nqi los xyuas kom meej lub compactness ntawm txheej txheej.Thaum lub siab ntawm cov roj residual nyob rau hauv lub tshuab nqus tsev chamber yog tas li, lub bombardment tus nqi ntawm substrate yog ib tug tas li tus nqi.Yog li ntawd, cov roj seem uas muaj nyob rau hauv cov yeeb yaj kiab tso tom qab xaiv qhov kev tso nyiaj ntau dua yuav raug txo, yog li txo cov tshuaj tiv thaiv ntawm cov roj seem ntawm cov roj molecules thiab cov evaporated zaj duab xis.Yog li ntawd, lub purity ntawm deposited zaj duab xis tuaj yeem txhim kho.Nws yuav tsum tau muab sau tseg hais tias yog hais tias tus deposition tus nqi yog heev ceev, nws yuav ua rau kom lub internal kev nyuaj siab ntawm cov zaj duab xis, nws yuav ua rau kom cov tsis xws luag nyob rau hauv cov zaj duab xis, thiab txawm ua rau lub rupture ntawm zaj duab xis.Hauv particular, nyob rau hauv cov txheej txheem ntawm reactive evaporation plating, nyob rau hauv thiaj li yuav ua rau cov tshuaj tiv thaiv cov pa tag nrho reacts nrog cov khoom ntawm evaporation zaj duab xis, koj muaj peev xwm xaiv ib tug tsawg deposition tus nqi.Tau kawg, cov ntaub ntawv sib txawv xaiv cov evaporation sib txawv.Raws li qhov ua piv txwv - qhov tso tawm ntawm cov yeeb yaj kiab reflective, Yog tias cov yeeb yaj kiab tuab yog 600 × 10-8cm thiab lub sijhawm evaporation yog 3s, qhov cuam tshuam yog 93%.Txawm li cas los xij, yog tias tus nqi evaporation qeeb qeeb nyob rau hauv tib lub thickness, nws yuav siv sij hawm 10 feeb los ua kom tiav cov zaj duab xis deposition.Lub sijhawm no, cov yeeb yaj kiab thickness yog tib yam.Txawm li cas los xij, qhov kev xav tau poob mus rau 68%.
2. Subtrate kub yuav cuam tshuam rau evaporation txheej
Qhov kub ntawm substrate muaj qhov cuam tshuam zoo rau lub evaporation txheej.Cov roj seem ntawm cov roj molecules adsorbed rau ntawm lub substrate nto ntawm qhov kub thiab txias substrate yog yooj yim tshem tawm.Tshwj xeeb tshaj yog kev tshem tawm cov dej vapor molecules yog qhov tseem ceeb dua.Ntxiv mus, ntawm qhov kub siab dua, nws tsis yog tsuas yog yooj yim los txhawb kev hloov pauv ntawm lub cev adsorption mus rau chemical adsorption, yog li ua kom muaj zog ntawm cov khoom sib txuas.Tsis tas li ntawd, nws tseem tuaj yeem txo qhov sib txawv ntawm qhov kub ntawm recrystallization ntawm vapor molecules thiab substrate kub, yog li txo lossis tshem tawm cov kev ntxhov siab sab hauv ntawm cov yeeb yaj kiab raws li kev sib tshuam.Tsis tas li ntawd, vim hais tias qhov kub ntawm substrate muaj feem xyuam rau lub xeev crystalline ntawm zaj duab xis, nws yog feem ntau yooj yim rau tsim amorphous los yog microcrystalline coatings nyob rau hauv cov kev mob ntawm qis substrate kub los yog tsis muaj cua sov.Ntawm qhov tsis sib xws, thaum qhov kub thiab txias, nws yog ib qho yooj yim los tsim crystalline txheej.Kev nce qhov kub ntawm substrate kuj yog qhov tsim nyog rau kev txhim kho cov khoom siv ntawm cov txheej txheem.Tau kawg, qhov kub ntawm substrate yuav tsum tsis txhob siab dhau los tiv thaiv evaporation ntawm txheej.
3. Residual gas siab nyob rau hauv lub tshuab nqus tsev chamber yuav cuam tshuam rau zaj duab xis zog
Lub siab ntawm cov roj residual hauv lub tshuab nqus tsev chamber muaj kev cuam tshuam zoo rau kev ua haujlwm ntawm daim nyias nyias.Cov roj seem ntawm cov roj molecules nrog lub siab dhau heev tsis tsuas yog yooj yim rau kev sib tsoo nrog cov evaporating hais, uas yuav txo tau lub zog kinetic ntawm cov neeg ntawm lub substrate thiab cuam tshuam rau adhesion ntawm zaj duab xis.Tsis tas li ntawd, cov roj residual siab dhau heev lawm yuav cuam tshuam rau cov purity ntawm cov zaj duab xis thiab txo qhov kev ua tau zoo ntawm cov txheej.
4. Evaporation kub nyhuv ntawm evaporation txheej
Cov nyhuv ntawm evaporation kub ntawm daim nyias nyias kev ua tau zoo yog qhia los ntawm kev hloov ntawm evaporation tus nqi nrog kub.Thaum lub evaporation kub siab, qhov kub ntawm vaporization yuav txo.Yog hais tias cov ntaub ntawv membrane yog evaporated saum toj no evaporation kub, txawm ib tug me ntsis hloov nyob rau hauv qhov kub thiab txias yuav ua rau ib tug ntse hloov nyob rau hauv lub evaporation tus nqi ntawm cov ntaub ntawv membrane.Yog li ntawd, nws yog ib qho tseem ceeb heev uas yuav tsum tswj cov evaporation kub kom raug thaum lub sij hawm deposition ntawm zaj duab xis kom tsis txhob loj kub gradient thaum lub evaporation qhov chaw yog rhuab.Rau cov khoom siv zaj duab xis uas yooj yim rau sublimate, nws tseem ceeb heev rau xaiv cov khoom nws tus kheej ua lub rhaub rau evaporation thiab lwm yam kev ntsuas.
5. Kev tu lub xeev ntawm substrate thiab txheej chamber yuav cuam tshuam rau kev ua haujlwm ntawm txheej
Cov nyhuv ntawm kev huv ntawm lub substrate thiab txheej txheej chamber ntawm kev ua tau zoo ntawm cov txheej yuav tsis raug ignored.Nws yuav tsis tsuas cuam tshuam rau purity ntawm deposited zaj duab xis, tab sis kuj txo cov adhesion ntawm zaj duab xis.Yog li ntawd, kev ua kom huv ntawm lub substrate, kev kho mob ntawm lub tshuab nqus tsev txheej chamber thiab nws cov khoom muaj feem xyuam (xws li lub substrate thav duab) thiab degassing nto yog tag nrho cov txheej txheem indispensable nyob rau hauv lub tshuab nqus tsev txheej txheej txheem.
Post lub sij hawm: Feb-28-2023