Txheej txheem khiav ntawm Sputtering txheej tshuab

1. Bombardment tu substrate

1.1) Sputtering txheej tshuab siv glow paug los ntxuav lub substrate.Uas yog hais tias, them cov roj argon rau hauv lub chamber, tawm voltage yog nyob ib ncig ntawm 1000V, Tom qab tig rau lub hwj chim mov, ib tug glow paug yog generated, thiab lub substrate yog ntxuav los ntawm argon ion bombardment.

1.2) Nyob rau hauv sputtering txheej tshuab uas industrially tsim high-end ornaments, titanium ions emitted los ntawm me me arc qhov chaw feem ntau yog siv los ntxuav.Lub tshuab sputtering txheej yog nruab nrog me me arc qhov chaw, thiab titanium ion kwj hauv arc plasma generated los ntawm qhov me me arc qhov paug yog siv los foob pob thiab ntxuav lub substrate.

2. Titanium nitride txheej

Thaum tso cov titanium nitride nyias zaj duab xis, cov khoom siv rau sputtering yog lub hom phiaj titanium.Cov khoom siv lub hom phiaj yog txuas nrog qhov tsis zoo electrode ntawm sputtering fais fab mov, thiab lub hom phiaj voltage yog 400 ~ 500V;Lub argon flux yog tsau, thiab lub tshuab nqus tsev tswj yog (3 ~ 8) x10^-1PA.Lub substrate txuas nrog qhov tsis zoo electrode ntawm lub zog tsis zoo, nrog rau qhov hluav taws xob ntawm 100 ~ 200V.

Tom qab tig lub zog ntawm lub hom phiaj sputtering titanium, lub teeb ci tawm yog tsim, thiab lub zog siab argon ions foob pob lub hom phiaj, sputtering titanium atoms ntawm lub hom phiaj.

Cov tshuaj tiv thaiv roj nitrogen tau qhia, thiab cov titanium atoms thiab nitrogen yog ionized rau hauv titanium ions thiab nitrogen ions nyob rau hauv lub txheej chamber.Nyob rau hauv qhov kev nyiam ntawm qhov tsis zoo ntawm cov hluav taws xob tsis zoo siv rau lub substrate, titanium ions thiab nitrogen ions nrawm rau saum npoo ntawm substrate rau tshuaj lom neeg cov tshuaj tiv thaiv thiab deposition los tsim titanium nitride zaj duab xis txheej.

3. Tshem tawm lub substrate

Tom qab ncav cuag lub predetermined zaj duab xis thickness, tua lub sputtering fais fab mov, substrate bias fais fab mov, thiab cua qhov chaw.Tom qab lub substrate kub yog qis dua 120 ℃, sau lub txheej chamber nrog cua thiab tshem tawm cov substrate.

Kab lus no yog luam tawm los ntawmmagnetron sputtering txheej tshuab manufacturers- Guangdong Zhenhua.