Feem ntau CVD cov tshuaj tiv thaiv cia siab rau qhov kub siab, yog li hu ua thermally zoo siab tshuaj vapor deposition (TCVD).Nws feem ntau siv inorganic precursors thiab yog ua nyob rau hauv kub-wall thiab txias-wall reactors.Nws cov txheej txheem rhuab muaj xws li xov tooj cua zaus (RF) cua sov, hluav taws xob hluav taws xob infrared, cua sov ua haujlwm, thiab lwm yam.
Kub phab ntsa tshuaj vapor deposition
Tiag tiag, kub-phab ntsa tshuaj vapor deposition reactor yog ib tug thermostatic rauv, feem ntau rhuab nrog resistive ntsiab, rau intermittent ntau lawm.Kev kos duab ntawm cov phab ntsa kub tshuaj vapor deposition chaw tsim khoom rau cov cuab yeej chip txheej yog qhia raws li hauv qab no.Qhov kub-phab ntsa tshuaj vapor deposition tuaj yeem ua rau TiN, TiC, TiCN thiab lwm cov yeeb yaj kiab nyias.Lub reactor tuaj yeem tsim kom loj txaus ces tuav ntau cov khoom, thiab cov xwm txheej tuaj yeem tswj tau meej heev rau kev tso tawm.Pic 1 qhia txog cov txheej txheem epitaxial rau silicon doping ntawm cov khoom siv semiconductor ntau lawm.Lub substrate nyob rau hauv lub cub tawg yog muab tso rau hauv ib tug ntsug kev taw qhia kom txo tau cov kab mob ntawm lub deposition nto los ntawm hais, thiab zoo heev ua rau kom ntau lawm loading.Kub-phab ntsa reactors rau kev tsim khoom semiconductor feem ntau ua haujlwm ntawm qhov tsis tshua muaj siab.
Post lub sij hawm: Nov-08-2022