No.1 Ụkpụrụ nke nnukwu ike pulsed magnetron sputtering
The elu ike pulsed magnetron sputtering Usoro na-eji elu elu usu ike (2-3 iwu nke ịdị ukwuu dị elu ka omenala magnetron sputtering) na ala pulse ọrụ okirikiri (0.5% -10%) iji nweta elu metal dissociation ọnụego (> 50%), nke a na-enweta site na njirimara sputtering magnetron, dị ka egosiri na foto 1, ebe ọnụ ọgụgụ kachasị elu nke njupụta ugbu a bụ m nhata na ike nth nke mwepu voltaji U, I = kUn (n bụ ihe jikọrọ ya na usoro cathode, oghere magnetik. na ihe).Na njupụta ike dị ala (obere voltaji) uru n na-abụkarị 5 ruo 15;na voltaji na-agbapụta na-arịwanye elu, njupụta dị ugbu a na njupụta ike na-abawanye ngwa ngwa, na elu voltaji uru n na-aghọ 1 n'ihi nkwụsị nke njide magnetik.Ọ bụrụ na njupụta ike dị ala, a na-ekpebi nkwụsị gas site na ion gas nke dị na ọnọdụ mwepu pulsed nkịtị;Ọ bụrụ na njupụta nke ike dị elu, ọnụ ọgụgụ nke ion metal na plasma na-abawanye na ụfọdụ ihe na-agbanwe, nke ahụ bụ na ọnọdụ nke onwe ya, ya bụ, a na-edobe plasma site na ionization nke ionization nke ionization nke na-anọpụ iche na ion nke abụọ, na atom gas inert. dị ka Ar na-eji naanị ọkụ na plasma, mgbe nke sputtered metal ahụ na-ionized nso lekwasịrị anya na accelerated azụ ka bombard sputtered lekwasịrị n'okpuru edinam nke magnetik na electric ubi iji nọgide na-enwe elu ugbu a mwepu, na plasma bụ nke ukwuu. ionized metal ahụ.N'ihi sputtering usoro nke kpo oku mmetụta na lekwasịrị anya, iji hụ na anụ ọrụ nke lekwasịrị na ulo oru ngwa, ike njupụta ozugbo etinyere lekwasịrị apụghị ịbụ kwa nnukwu, n'ozuzu kpọmkwem mmiri jụrụ na lekwasịrị ihe thermal conductivity. kwesịrị ịbụ n'ihe banyere 25 W / cm2 n'okpuru, mmiri jụrụ oyi na-apụtaghị ìhè, ihe ezubere iche nke thermal conductivity adịghị mma, ihe ezubere iche kpatara nkewa n'ihi nrụgide okpomọkụ ma ọ bụ ihe ezubere iche nwere ihe ndị na-adịghị agbanwe agbanwe na ihe ndị ọzọ nke njupụta ike nwere ike ịdị na ya. 2 ~ 15 W / cm2 n'okpuru, dị n'okpuru ihe achọrọ nke njupụta ike dị elu.Enwere ike idozi nsogbu nke ikpo oke ọkụ nke ebumnuche site n'iji ike dị elu dị warara.Anders na-akọwa ike dị elu pulsed magnetron sputtering dị ka ụdị pulsed sputtering ebe oke ike njupụta karịrị nkezi ike njupụta site na 2 ruo 3 iwu nke ịdị ukwuu, na ion sputtering lekwasịrị anya na-achịkwa usoro ịgbasa sputtering, na ebumnuche sputtering atọm na-ekewa nke ukwuu. .
No.2 The e ji mara elu ike pulsed magnetron sputtering mkpuchi nkwụnye ego
Nnukwu ike pulsed magnetron sputtering nwere ike iwepụta plasma nwere oke dissociation ọnụego na ike ion dị elu, ma nwee ike itinye nrụgide nhụsianya iji mee ka ion ebubo ahụ dịkwuo elu, na usoro ntinye mkpuchi mkpuchi na-agbaze site na oke ume ike, nke bụ nkà na ụzụ IPVD na-ahụkarị.Ike ion na nkesa nwere mmetụta dị oke mkpa na mkpuchi mkpuchi na arụmọrụ.
Banyere IPVD, dabere na ama ama Thorton structural model, Anders tụrụ aro usoro nhazi mpaghara nke na-agụnye ntinye plasma na ion etching, gbasaa mmekọrịta dị n'etiti mkpuchi mkpuchi na ọnọdụ okpomọkụ na nrụgide ikuku na usoro nhazi mpaghara Thorton na mmekọrịta dị n'etiti mkpuchi mkpuchi, okpomọkụ na ike ion, dị ka egosiri na foto 2. N'ihe gbasara mkpuchi ion ike dị ala, ihe mkpuchi mkpuchi na-agbaso usoro mpaghara mpaghara Thorton.Site na mmụba nke ọnọdụ okpomọkụ, mgbanwe site na mpaghara 1 (kristal ndị na-adịghị mma) na mpaghara T (kristal fiber na-acha ọkụ), mpaghara 2 (kristal kọlụm) na mpaghara 3 (mpaghara recrystallization);na mmụba nke ntinye ion ike, mgbanwe okpomọkụ site na mpaghara 1 gaa na mpaghara T, mpaghara 2 na mpaghara 3 na-ebelata.Enwere ike ịkwadebe kristal eriri dị elu na kristal columnar na obere okpomọkụ.Mgbe ike nke ion ndị a na-echekwa na-abawanye n'usoro nke 1-10 eV, bombu na etching nke ions na mkpuchi mkpuchi na-eme ka ọ dịkwuo elu ma na-abawanye ụba nke mkpuchi.
No.3 Nkwadebe nke ike mkpuchi oyi akwa site elu ike pulsed magnetron sputtering technology
Ihe mkpuchi a kwadebere site na teknụzụ magnetron sputtering ike dị elu dị oke ọnụ, nwere akụrụngwa akụrụngwa ka mma yana nkwụsi ike dị elu.Dị ka e gosiri na foto 3, ihe mkpuchi TiAlN magnetron na-agbasa bụ ihe owuwu kristal kọlụm nwere ike nke 30 GPa na modul nke Young nke 460 GPa;mkpuchi HIPIMS-TiAlN bụ 34 GPa hardness ebe modul nke Young bụ 377 GPa;oke dị n'etiti ike siri ike na modul Young bụ ihe nleba anya siri ike nke mkpuchi.Isi ike dị elu na obere modul nke ntorobịa pụtara isi ike ka mma.Ihe mkpuchi HIPIMS-TiAlN nwere nkwụsi ike dị elu ka mma, yana usoro hexagonal AlN na-ebuli na mkpuchi TiAlN a na-ahụkarị mgbe ọgwụgwọ anneal okpomọkụ dị elu na 1,000 Celsius C maka awa 4.Ike nke mkpuchi na-ebelata na okpomọkụ dị elu, ebe mkpuchi HIPIMS-TiAlN na-anọgide na-agbanweghị mgbe ọgwụgwọ okpomọkụ gasịrị n'otu oge okpomọkụ na oge.HIPIMS-TiAlN mkpuchi nwekwara elu mmalite okpomọkụ nke elu okpomọkụ oxidation karịa uwe mkpuchi.Ya mere, mkpuchi HIPIMS-TiAlN na-egosi arụmọrụ dị mma na ngwa ngwa ịkpụ ngwa ngwa karịa ngwaọrụ ndị ọzọ mkpuchi nke PVD kwadebere.
Oge nzipu: Nov-08-2022