Akụkụ bụ isi nke usoro ikuku evaporation nke oghere maka ịdebe ihe nkiri bụ ọnụ ọgụgụ dị elu.Isi ihe dị na usoro sputtering bụ ihe dị iche iche nke ihe nkiri dị na ya na ọdịdị dị mma nke oyi akwa ihe nkiri, ma ọnụ ọgụgụ ntinye dị ala.Mkpuchi ion bụ usoro na-ejikọta usoro abụọ a.
Ụkpụrụ mkpuchi ion na ọnọdụ nhazi ihe nkiri
E gosipụtara ụkpụrụ ọrụ nke mkpuchi ion na foto ahụ.A na-agbanye oghere oghere na nrụgide dị n'okpuru 10-4 Pa, wee jupụta na gas inert (dịka argon) na nrụgide nke 0.1 ~ 1 Pa. Mgbe a na-etinye voltaji DC na-adịghị mma ruo 5 kV na mkpụrụ, a. E guzobe mpaghara plasma na-agbapụta obere ikuku gas n'etiti mkpụrụ na crucible.The inert gas ion na-accelerated site eletriki ubi na bombard elu nke mkpụrụ, si otú ihicha elu nke workpiece.Mgbe emechara usoro nhicha a, usoro mkpuchi na-amalite site na vaporization nke ihe a ga-ekpuchi na crucible.The vaporized irighiri irighiri na-abanye na plasma mpaghara na-adaba na dissociated inert nti ion na electrons, na ụfọdụ n'ime vapor ahụ na-dissociated na bombard workpiece na mkpuchi elu n'okpuru osooso nke eletriki ubi.N'ime usoro ntinye nke ion, ọ bụghị nanị na ọ na-agbapụta ion dị mma na mkpụrụ ahụ, ya mere enwere ike ịmepụta ihe nkiri dị mkpa naanị mgbe mmetụta ntinye dị ukwuu karịa mmetụta sputtering.
Usoro mkpuchi ion, bụ nke a na-eji ion ike dị elu na-agbanye mkpụrụ mgbe niile, dị ọcha ma nwee ọtụtụ uru ma e jiri ya tụnyere sputtering na evaporation mkpuchi.
(1) Adhesion siri ike, mkpuchi mkpuchi anaghị apụ ngwa ngwa.
(a) N'ime usoro mkpuchi ion, a na-eji ọnụ ọgụgụ buru ibu nke ike dị elu na-emepụta site na nkwụsị na-egbuke egbuke na-emepụta mmetụta cathodic sputtering n'elu nke mkpụrụ osisi ahụ, na-agbapụta ma na-ehichapụ gas na mmanụ na-adaba n'elu. mkpụrụ iji mee ka elu ala dị ọcha ruo mgbe usoro mkpuchi niile gwụchara.
(b) N'oge mmalite nke mkpuchi, sputtering na nkwụnye ego na-ebikọ ọnụ, nke nwere ike ịmepụta ihe ngbanwe nke ihe ndị dị na interface nke isi ihe nkiri ma ọ bụ ngwakọta nke ihe nkiri na ihe ndabere, nke a na-akpọ "pseudo-diffusion Layer", nke nwere ike imeziwanye arụmọrụ adhesion nke ihe nkiri ahụ nke ọma.
(2) Ngwongwo ihe mkpuchi dị mma.Otu ihe kpatara ya bụ na atom ihe mkpuchi mkpuchi bụ ionized n'okpuru nrụgide dị elu ma na-adaba na ụmụ irighiri gas ọtụtụ ugboro n'oge usoro nke iru mkpụrụ, nke mere na ion ihe mkpuchi nwere ike gbasasịa gburugburu mkpụrụ.Tụkwasị na nke ahụ, a na-edobe ihe mkpuchi ihe mkpuchi ionized n'elu ihe nkedo n'okpuru ọrụ nke ọkụ eletrik, ya mere a na-etinye mkpụrụ ahụ dum na ihe nkiri dị mkpa, ma mkpuchi evaporation enweghị ike nweta mmetụta a.
(3) Ọdịdị dị elu nke mkpuchi ahụ bụ n'ihi nsị nke condensates kpatara site na bombu mgbe nile nke ihe nkiri a na-etinye na ions dị mma, nke na-eme ka njupụta nke mkpuchi mkpuchi dịkwuo mma.
(4) Nhọrọ dịgasị iche iche nke ihe mkpuchi na ihe ndị na-emepụta ihe nwere ike ịtinye ya na ọla ma ọ bụ ihe na-abụghị ọla.
(5) E jiri ya tụnyere kemịkalụ vapor deposition (CVD), ọ nwere ọnọdụ okpomọkụ dị ala, nke na-adịkarị n'okpuru 500 Celsius, mana ike nchikota ya bụ nke a na-atụnyere nke ọma na ihe nkiri vepor kemịkalụ.
(6) Ọnụ ego nkwụnye ego dị elu, nhazi ihe nkiri ngwa ngwa, yana ike kpuchie ọkpụrụkpụ ihe nkiri site na iri puku nanometers ruo microns.
Ihe ọghọm nke mkpuchi ion bụ: ọkpụrụkpụ nke ihe nkiri ahụ enweghị ike ịchịkwa nke ọma;ntinye nke ntụpọ dị elu mgbe achọrọ mkpuchi dị mma;na gas ga-abanye n'elu n'oge mkpuchi, nke ga-agbanwe ihe ndị dị n'elu.N'ọnọdụ ụfọdụ, a na-emepụtakwa oghere na oghere (ihe na-erughị 1 nm).
N'ihe gbasara ọnụego nkwụnye ego, mkpuchi ion dị ka usoro evaporation.Banyere àgwà ihe nkiri, ihe nkiri ndị a na-emepụta site na mkpuchi ion dị nso ma ọ bụ dị mma karịa nke a kwadebere site na sputtering.
Oge nzipu: Nov-08-2022