Njirimara Plasma
Ọdịdị nke plasma na ntinye kemịkalụ kemịkalụ kwalitere plasma bụ na ọ na-adabere na ike kinetic nke eletrọn na plasma iji mee ka mmeghachi omume kemịkal dị na mpaghara gas.Ebe ọ bụ na plasma bụ nchịkọta nke ion, electrons, atoms na-anọpụ iche na ụmụ irighiri ihe, ọ na-anọpụ iche na eletrik na ọkwa macroscopic.Na plasma, a na-echekwa ike dị ukwuu n'ime ike nke plasma.E kewara Plasma ka ọ bụrụ plasma na-ekpo ọkụ na plasma oyi.na sistemu PECVD ọ bụ plasma oyi nke a na-emepụta site na mwepu gas dị ala.Plasma a na-emepụta site na mwepu nrụgide dị ala n'okpuru narị ole na ole Pa bụ plasma na-enweghị nha nhata.
Njirimara nke plasma a bụ nke a:
(1) Mgbanwe okpomọkụ nke eletrọn na ion na-adịghị agafe agafe karịa mmegharị ha na-eduzi.
(2) Usoro ionization ya na-ebutekarị site na nkukota nke electrons ngwa ngwa na ụmụ irighiri gas.
(3) The nkezi thermal ngagharị ume nke electrons bụ 1 ka 2 iwu nke ịdị ukwuu karịa nke arọ irighiri, dị ka molekul, atọm, ion na free radicals.
(4) The ike ọnwụ mgbe nkukota nke electrons na arọ ahụ nwere ike kwụọ ụgwọ si eletrik n'etiti collisions.
Ọ na-esiri ike ịkọwa plasma na-enweghị okpomọkụ na-adịghị ala ala na ọnụ ọgụgụ dị nta nke paramita, n'ihi na ọ bụ plasma na-adịghị ala ala na usoro PECVD, ebe electron okpomọkụ Te abụghị otu okpomọkụ Tj nke ihe dị arọ.Na teknụzụ PECVD, ọrụ bụ isi nke plasma bụ imepụta ion na-arụ ọrụ kemịkal na radicals efu.Ndị a ion na free radicals na-emeghachi omume na ndị ọzọ ion, atọm na ụmụ irighiri ihe na gas na-adọ ma ọ bụ na-akpata lattice mmebi na chemical Jeremaya mere na mkpụrụ n'elu, na mkpụrụ nke na-arụ ọrụ ihe onwunwe bụ a ọrụ nke electron njupụta, reactant ịta na mkpụrụ ọnụọgụ.N'ikwu ya n'ụzọ ọzọ, mkpụrụ nke ihe na-arụ ọrụ na-adabere na ike ọkụ eletrik, nrụgide gas, na nkezi free nke ihe ndị ahụ n'oge nkukota.Ka gas na-emeghachi omume na plasma na-ekewa n'ihi nkukota nke electrons dị elu, enwere ike imeri ihe mgbochi nke mmeghachi omume kemịkal na okpomọkụ nke gas reactant nwere ike ibelata.Isi ihe dị iche n'etiti PECVD na CVD nkịtị bụ na ụkpụrụ thermodynamic nke mmeghachi omume kemịkal dị iche.Nkewa nke mkpụrụ ndụ gas na plasma abụghị nke a na-ahọrọ, ya mere oyi akwa ihe nkiri nke PECVD debere dị iche na CVD nkịtị.Ngwakọta nke usoro nke PECVD mepụtara nwere ike bụrụ nke na-abụghị nha nha pụrụ iche, na nguzobe ya ejedebeghịkwa site na nha nhata.Igwe ihe nkiri kachasị ahụkarị bụ steeti amorphous.
Njirimara PECVD
(1) Okpomọkụ nkwụnye ego dị ala.
(2) Belata nrụgide dị n'ime ya kpatara ndakọrịta nke ọnụọgụ mgbasawanye ahịrị nke akpụkpọ ahụ/base ihe.
(3) Ọnụ ego nkwụnye ego dị oke elu, karịsịa obere okpomọkụ, nke na-enye aka inweta ihe nkiri amorphous na microcrystalline.
N'ihi na obere okpomọkụ usoro nke PECVD, thermal mmebi nwere ike ibelata, ibe mgbasa ozi na mmeghachi omume n'etiti film oyi akwa na mkpụrụ ihe nwere ike ibelata, na ihe ndị ọzọ, nke mere na electronic components nwere ike mkpuchi ma tupu e mere ha ma ọ bụ n'ihi mkpa. maka ịrụgharị ọrụ.N'ihi na mmepụta nke ultra-nnukwu ọnụ ọgụgụ integrated sekit (VLSI, ULSI), PECVD technology na-ọma etinyere na e guzobere silicon nitride film (SiN) dị ka ikpeazụ ihe nkiri nchebe mgbe e guzobere Al electrode wiring, yana flattening na guzobe ihe nkiri silicon oxide dị ka mkpuchi interlayer.Dị ka ihe nkiri dị gịrịgịrị, teknụzụ PECVD etinyewokwa nke ọma n'imepụta transistor ihe nkiri dị mkpa (TFT) maka ngosipụta LCD, wdg, na-eji iko dị ka mkpụrụ n'ime usoro matriks na-arụ ọrụ.Site na mmepe nke sekit jikọtara ọnụ na ọnụ ọgụgụ buru ibu na njikọta dị elu yana ojiji nke ngwaọrụ semiconductor mejupụtara, achọrọ PECVD ka eme ya na obere okpomọkụ yana usoro ike elektrọn dị elu.Iji mezuo ihe a chọrọ, a ga-emepụta teknụzụ ndị nwere ike ịmepụta ihe nkiri flatness dị elu na obere okpomọkụ.A na-amụ ihe nkiri SiN na SiOx nke ọma site na iji plasma ECR na teknụzụ ọhụrụ plasma vapor deposition (PCVD) nke nwere plasma helical, ma rute ọkwa dị irè n'iji ihe nkiri mkpuchi interlayer maka nnukwu sekit jikọtara ọnụ, wdg.
Oge nzipu: Nov-08-2022