CVD coating technology has the following characteristics:
1. The process operation of CVD equipment is relatively simple and flexible, and it can prepare single or composite films and alloy films with different proportions;
2. CVD coating has a wide range of applications, and can be used to prepare various metal or metal film coatings;
3. High production efficiency due to deposition rates ranging from a few microns to hundreds of microns per minute;
4. Compared with PVD method, CVD has better diffraction performance and is very suitable for coating substrates with complex shapes, such as grooves, coated holes, and even blind hole structures. The coating can be plated into a film with good compactness. Due to the high temperature during the film forming process, and the strong adhesion on the film substrate interface, the film layer is very firm
5. The damage caused by radiation is relatively low and can be integrated with MOS integrated circuit processes.
——This article is published by Guangdong Zhenhua, a vacuum coating machine manufacturer
Post time: Mar-29-2023