The tungsten filament is heated to a high temperature that emits hot electrons to emit a high-density electron stream, and at the same time an accelerating electrode is set to accelerate the hot electrons into a high-energy electron stream. High-density, high-energy electron flow can be more chlorine ionization, more metal film layer atoms ionized to obtain more chloride ions to improve the sputtering rate, thereby increasing the deposition rate: can be more metal ionization to improve the metal ionization rate, conducive to the reaction of the deposition of the compound film; metal film layer ions to reach the workpiece to improve the current density of the work piece, thereby increasing the deposition rate.
In the magnetron sputtering hard coating,Increase in current density and film organization of the workpiece front and back of the hot cathodizing. TiSiCN before the addition of hot cathode, the current density on the workpiece is only 0.2mA/mm, after the increase in the hot cathode to 4.9mA/mm2, which is equivalent to an increase of 24 times or so, and the film organization is more dense. It can be seen that in magnetron sputtering coating technology, the addition of a hot cathode is very effective in improving the magnetron sputtering deposition rate and the activity of the film particles. This technology can significantly improve the life of turbine blades, mud pump plungers, and grinder parts.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Oct-11-2023