The hot wire arc enhanced plasma chemical vapor deposition technology uses the hot wire arc gun to emit arc plasma, abbreviated as the hot wire arc PECVD technology. This technology is similar to the hot wire arc gun ion coating technology, but the difference is that the solid film obtained by hot wire arc gun ion coating uses the arc light electron flow emitted by the hot wire arc gun to heat and evaporate the metal in the crucible, while the hot wire arc light PECVD is fed with reaction gases, such as CH4 and H2, which are used for depositing diamond films. By relying on the high-density arc discharge current emitted by the hot wire arc gun, the reactive gas ions are excited to obtain various active particles, including gas ions, atomic ions, active groups, and so on.
In the hot wire arc PECVD device, two electromagnetic coils are still installed outside the coating room, causing the high-density electron flow to rotate during the movement towards the anode, increasing the probability of collision and ionization between the electron flow and the reaction gas. The electromagnetic coil can also converge into an arc column to increase the plasma density of the entire deposition chamber. In arc plasma, the density of these active particles is high, making it easier to deposit diamond films and other film layers on the workpiece.
——This article was released by Guangdong Zhenhua Technology, a manufacturer of optical coating machines.
Post time: May-05-2023