There are two main modes of ion beam-assisted deposition, one is dynamic hybrid; the other is static hybrid. The former refers to the film in the growth process is always accompanied by a certain energy and beam current of ion bombardment and film; the latter is pre-deposited on the surface of the substrate a layer of less than a few nanometers thickness of the film layer, and then dynamic ion bombardment, and can be repeated many times and the growth of the film layer.
The ion beam energies chosen for ion beam assisted deposition of thin films are in the range of 30 eV to 100 keV. The energy range chosen depends on the type of application for which the film is being synthesized. For example, the preparation of corrosion protection, anti-mechanical wear, decorative coatings and other thin films should be selected higher bombardment energy. Experiments show that, such as the choice of 20 to 40keV energy of the ion beam bombardment, the substrate material and the film itself will not affect the performance and use of the damage. In the preparation of thin films for optical and electronic devices, lower energy ion beam assisted deposition should be selected, which not only reduces the light adsorption and avoids the formation of electrically activated defects, but also facilitates the formation of the membrane’s steady state structure. Studies have shown that films with excellent properties can be obtained by choosing ion energies lower than 500 eV.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Mar-11-2024