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  • Application Fields of Plasma Surface Modification

    Application Fields of Plasma Surface Modification

    1) Plasma surface modification mainly refers to certain modifications of paper, organic films, textiles, and chemical fibers. The use of plasma for textile modification does not require the use of activators, and the treatment process does not damage the characteristics of the fibers themselves. ...
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  • Application of ion coating in the field of optical thin films

    Application of ion coating in the field of optical thin films

    The application of optical thin films is very extensive, ranging from glasses, camera lenses, mobile phone cameras, LCD screens for mobile phones, computers, and televisions, LED lighting, biometric devices, to energy-saving windows in automobiles and buildings, as well as medical instruments, te...
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  • Information display films and ion coating technology

    Information display films and ion coating technology

    1. Type of film in information display In addition to TFT-LCD and OLED thin films, the information display also includes wiring electrode films and transparent pixel electrode films in the display panel.The coating process is the core process of TFT-LCD and OLED display. With the continuous prog...
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  • The growth law of vacuum evaporation coating film layer

    The growth law of vacuum evaporation coating film layer

    During evaporation coating, the nucleation and growth of the film layer are the basis of various ion coating technology 1.Nucleation In vacuum evaporation coating technology,after the film layer particles are evaporated from the evaporation source in the form of atoms, they fly directly to the w...
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  • Common features of enhanced glow discharge ion coating technology

    Common features of enhanced glow discharge ion coating technology

    1. The workpiece bias is low Due to the addition of a device to increase the ionization rate, the discharge current density is increased, and the bias voltage is reduced to 0.5~1kV. The backsputtering caused by excessive bombardment of high-energy ions and the damage effect on the workpiece surf...
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  • Advantages of Cylindrical targets

    Advantages of Cylindrical targets

    1) Cylindrical targets has Higher utilization rate than planar targets. In the coating process, whether it is a rotary magnetic type or a rotary tube type cylindrical sputtering target, all parts of the surface of the target tube continuously pass through the sputtering area generated in front of...
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  • Plasma direct polymerization process

    Plasma direct polymerization process

    Plasma direct polymerization process The process of Plasma polymerization is relatively simple for both internal electrode polymerization equipment and external electrode polymerization equipment, but parameter selection is more important in Plasma polymerization, because parameters have a greate...
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  • Hot wire arc enhanced plasma chemical vapor deposition technology

    Hot wire arc enhanced plasma chemical vapor deposition technology

    The hot wire arc enhanced plasma chemical vapor deposition technology uses the hot wire arc gun to emit arc plasma, abbreviated as the hot wire arc PECVD technology. This technology is similar to the hot wire arc gun ion coating technology, but the difference is that the solid film obtained by ho...
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  • Introduction to Conventional Techniques for Depositing Hard Coatings

    Introduction to Conventional Techniques for Depositing Hard Coatings

    1. Thermal CVD technology Hard coatings are mostly metal ceramic coatings (TiN, etc.), which are formed by the reaction of metal in the coating and reactive gasification. At first, the thermal CVD technology was used to provide the activation energy of combination reaction by thermal energy at a ...
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  • What is resistance evaporation source coating?

    What is resistance evaporation source coating?

    Resistance evaporation source coating is a basic vacuum evaporation coating method. “Evaporation” refers to a thin film preparation method in which the coating material in the vacuum chamber is heated and evaporated, so that the material atoms or molecules vaporize and escape from the...
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  • Introduction to Cathodic Arc Ion Plating Technology

    Introduction to Cathodic Arc Ion Plating Technology

    The cathodic arc ion coating technology uses cold field arc discharge technology. The earliest application of cold field arc discharge technology in the coating field was by Multi Arc Company in the United States. The English name of this procedure is arc ionplating (AIP). Cathode arc ion coatin...
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  • The Application of Optical Thin Film in the Coated Glasses Industry

    The Application of Optical Thin Film in the Coated Glasses Industry

    There are many types of substrates for glasses and lenses, such as CR39, PC (polycarbonate), 1.53 Trivex156, medium refractive index plastic, glass, etc. For corrective lenses, the transmittance of both resin and glass lenses is only about 91%, and some of the light is reflected back by the two s...
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  • Features of vacuum coating machine

    Features of vacuum coating machine

    1.The film of vacuum coating is very thin (normally 0.01-0.1um)| 2.Vacuum coating can use for many plastic, such as ABS﹑PE﹑PP﹑PVC﹑PA﹑PC﹑PMMA, etc. 3. The film forming temperature is low. In the iron and steel industry, the coating temperature of hot galvanizing is generally between 400 ℃ a...
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  • Introduction to solar photovoltaic thin film technology

    Introduction to solar photovoltaic thin film technology

    After the discovery of the photovoltaic effect in Europe in 1863, the United States made the first photovoltaic cell with (Se) in 1883. In the early days, photovoltaic cells were mainly used in aerospace, military and other fields. In the past 20 years, the sharp decline in the cost of photovolta...
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  • Process Flow of Sputtering Coating Machine

    Process Flow of Sputtering Coating Machine

    1. Bombardment cleaning substrate 1.1) Sputtering coating machine use glow discharge to clean the substrate.  That is to say, charge the argon gas into the chamber,discharge voltage is around 1000V, After turning on the power supply, a glow discharge is generated, and the substrate is cleaned by ...
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