The film itself selectively reflects or absorbs incident light, and its color is the result of the optical properties of the film. The color of thin films is generated by reflected light, so two aspects need to be considered, namely the intrinsic color generated by the absorption characteristics ...
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In the world of advanced surface engineering, Physical Vapor Deposition (PVD) emerges as a go-to method for enhancing the performance and durability of various materials. Have you ever wondered how this cutting-edge technique works? Today, we delve into the intricate mechanics of P...
In today’s fast-paced world, where visual content has a lot of influence, optical coating technology plays an important role in improving the quality of various displays. From smartphones to TV screens, optical coatings have revolutionized the way we perceive and experience visual content. ...
Magnetron sputtering coating is carried out in glow discharge, with low discharge current density and low plasma density in the coating chamber. This makes magnetron sputtering technology have disadvantages such as low film substrate bonding force, low metal ionization rate, and low deposition ra...
1.Beneficial for sputtering and plating insulation film. The rapid change in electrode polarity can be used to directly sputter insulating targets to obtain insulating films. If a DC power source is used to sputter and deposit insulation film, the insulation film will block positive ions from ent...
1. The vacuum evaporation coating process includes the evaporation of film materials, the transport of vapor atoms in high vacuum, and the process of nucleation and growth of vapor atoms on the surface of the workpiece.
2. The deposition vacuum degree of vacuum evaporation coating is high, gener...
TiN is the earliest hard coating used in cutting tools, with advantages such as high strength, high hardness, and wear resistance. It is the first industrialized and widely used hard coating material, widely used in coated tools and coated molds. TiN hard coating was initially deposited at 1000 ℃...
High energy plasma can bombard and irradiate polymer materials, breaking their molecular chains, forming active groups, increasing surface energy, and generating etching. Plasma surface treatment does not affect the internal structure and performance of the bulk material, but only significantly c...
The process of cathodic arc source ion coating is basically the same as other coating technologies, and some operations such as installing workpieces and vacuuming are no longer repeated.
1.Bombardment cleaning of workpieces
Before coating, argon gas is introduced into the coating chamber with a...
1.Characteristics of arc light electron flow
The density of electron flow, ion flow, and high-energy neutral atoms in arc plasma generated by arc discharge is much higher than that of glow discharge. There are more gas ions and metal ions ionized, excited high-energy atoms, and various active gro...
1) Plasma surface modification mainly refers to certain modifications of paper, organic films, textiles, and chemical fibers. The use of plasma for textile modification does not require the use of activators, and the treatment process does not damage the characteristics of the fibers themselves. ...
The application of optical thin films is very extensive, ranging from glasses, camera lenses, mobile phone cameras, LCD screens for mobile phones, computers, and televisions, LED lighting, biometric devices, to energy-saving windows in automobiles and buildings, as well as medical instruments, te...
1. Type of film in information display
In addition to TFT-LCD and OLED thin films, the information display also includes wiring electrode films and transparent pixel electrode films in the display panel.The coating process is the core process of TFT-LCD and OLED display. With the continuous prog...
During evaporation coating, the nucleation and growth of the film layer are the basis of various ion coating technology
1.Nucleation
In vacuum evaporation coating technology,after the film layer particles are evaporated from the evaporation source in the form of atoms, they fly directly to the w...
1. The workpiece bias is low
Due to the addition of a device to increase the ionization rate, the discharge current density is increased, and the bias voltage is reduced to 0.5~1kV.
The backsputtering caused by excessive bombardment of high-energy ions and the damage effect on the workpiece surf...