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  • Characteristics of CVD coating equipment

    Characteristics of CVD coating equipment

    CVD coating technology has the following characteristics: 1. The process operation of CVD equipment is relatively simple and flexible, and it can prepare single or composite films and alloy films with different proportions; 2. CVD coating has a wide range of applications, and can be used to pre...
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  • What are the vacuum coating machine processes? What is the working principle?

    What are the vacuum coating machine processes? What is the working principle?

    The vacuum coating machine process is divided into: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating.   1、Vacuum evaporation coating Under the vacuum condition, make the material evaporated,such as the metal, metal alloy, etc.  then deposit them on the substrate surf...
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  • What does the vacuum machine for?

    What does the vacuum machine for?

    1、What is vacuum coating process? What is the function?   The so-called vacuum coating process uses evaporation and sputtering in a vacuum environment to emit particles of film material,Deposited on metal, glass, ceramics, semiconductors and plastic parts to form a coating layer, for deco...
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  • Environmental requirements for vacuum coating equipment

    Environmental requirements for vacuum coating equipment

    Since vacuum coating equipment works under vacuum conditions, the equipment must meet the requirements of vacuum for the environment. The industry standards for various types of vacuum coating equipment formulated in my country (including general technical conditions for vacuum coating equipment,...
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  • The characteristics and application of ion plating

    The characteristics and application of ion plating

    Film type Film material Substrate Film characteristics and application Metal film CrAI、ZnPtNi Au,Cu、AI P、Au Au、W、Ti、Ta Ag、Au、AI、Pt steel, mild steelTitanium alloy, high carbon steel, mild steelTitanium alloyhard glass plastic Nickel, Inconel steel, stainless steel silicon Anti-wear ...
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  • Vacuum ion coating and its classification

    Vacuum ion coating and its classification

    Vacuum ion plating (ion plating for short) is a new surface treatment technology which is developed rapidly in the 1970s, which was proposed by D.M. Mattox of Somdia Company in the United States in 1963. It refers to the process of using evaporation source or sputtering target to evaporate or spu...
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  • The optical coating machine can be used for coating multiple optical films

    The optical coating machine can be used for coating multiple optical films

    ① Anti-reflection film. For example, cameras, slide projectors, projectors, movie projectors, telescopes, sight glasses, and single-layer MgF films coated on lenses and prisms of various optical instruments, and double-layer or multi-layer broadband antireflection films composed of SiOFrO2, AlO, ...
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  • Characteristics of sputtering coating films

    Characteristics of sputtering coating films

    ① Good controllability and repeatability of film thickness Whether the film thickness can be controlled at a predetermined value is called film thickness controllability. The required film thickness can be repeated for many times, which is called film thickness repeatability.Because the discharge...
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  • Brief introduction of chemical vapor deposition (CVD) technology

    Brief introduction of chemical vapor deposition (CVD) technology

    Chemical Vapor Deposition (CVD) technology is a film-forming technology that uses heating, plasma enhancement, photo-assisted and other means to make gaseous substances produce solid films on the substrate surface through chemical reaction under normal or low pressure. Generally, the reaction in...
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  • Factors affecting the performance of vacuum evaporation plating

    Factors affecting the performance of vacuum evaporation plating

    1. Evaporation rate will effect on properties of evaporated coating The evaporation rate has a great influence on the deposited film. Because the coating structure formed by low deposition rate is loose and easy to produce large particle deposition, it is very safe to choose a higher evaporation ...
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  • What are the pollution sources of vacuum coating equipment

    What are the pollution sources of vacuum coating equipment

    The vacuum coating equipment is composed of many precise parts, which are made through many processes, such as welding, grinding, turning, planing, boring, milling and so on. Because of these works, the surface of equipment parts will inevitably be contaminated with some pollutants such as grease...
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  • What are the requirements of vacuum coating process on the application environment

    What are the requirements of vacuum coating process on the application environment

    The vacuum coating process has strict requirements for the application environment. For the conventional vacuum process, its main requirements for vacuum sanitation are: there is no accumulated pollution source on the parts or surface of the equipment in the vacuum, the surface of the vacuum cham...
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  • What is the Working Principle of Ion Plating machine

    What is the Working Principle of Ion Plating machine

    Ion coating machine originated from the theory proposed by D.M. Mattox in the 1960s, and corresponding experiments began at that time; Until 1971, Chambers and others published the technology of electron beam ion plating; The reactive evaporation plating (ARE) technology was pointed out in the Bu...
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  • Classification and application of vacuum coating equipment

    Classification and application of vacuum coating equipment

    The rapid development of vacuum coaters in today’s era has enriched the types of coaters. Next, let’s list the classification of coating and the industries to which the coating machine is applied. First of all, our coating machines can be divided into decorative coating equipment, ele...
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  • Brief introduction and advantages of magnetron sputtering coating equipment

    Brief introduction and advantages of magnetron sputtering coating equipment

    Magnetron sputtering principle: electrons collide with argon atoms in the process of accelerating to the substrate under the action of electric field, ionizing a large number of argon ions and electrons, and electrons fly to the substrate. The argon ion accelerates to bombard the target material ...
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