In the sputtering coating process, compounds can be used as targets for the preparation of chemically synthesized films. However, the composition of the film generated after sputtering of the target material often deviates greatly from the original composition of the target material, and therefore does not meet the requirements of the original design. If a pure metal target is used, the required active gas (e.g., oxygen when preparing oxide films) is consciously mixed into the working (discharge) gas, so that it reacts chemically with the target material to produce a thin film that can be controlled in terms of its composition and characteristics. This method is often referred to as “reaction sputtering”.
As mentioned earlier, RF sputtering can be used to deposit dielectric films and various compound films. However, in order to prepare a “pure” film, it is necessary to have a “pure” target, a high-purity oxide, nitride, carbide, or other compound powder. Processing these powders into a target of a certain shape requires the addition of additives necessary for molding or sintering, which results in a significant reduction in the purity of the target and the resulting film. In reactive sputtering, however, since high-purity metals and high-purity gases can be used, convenient conditions are provided for the preparation of high-purity films. Reactive sputtering has received increasing attention in recent years and has become a major method for precipitating thin films of various functional compounds. It has been widely used in the manufacture of I-V, I- and IV-V compounds, refractory semiconductors, and a variety of oxides, such as the use of polycrystalline Si and CH./Ar mixture of gases to shoot the precipitation of SiC thin films, Ti target and N/Ar to prepare TiN hard films, Ta and O/Ar to prepare TaO; dielectric thin films, Fe and O,/Ar to prepare -FezO; -FezO. recording films, AIN piezoelectric films with A1 and N/Ar, A1-C-O selective absorption films with AI and CO/Ar, and YBaCuO-superconducting films with Y-Ba-Cu and O/Ar, among others.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Jan-18-2024