1. Chromium target Chromium as a sputtering film material is not only easy to combine with the substrate with high adhesion, but also chromium and oxide to generate CrO3 film, its mechanical properties, acid resistance, thermal stability are better. In addition, chromium in the incomplete oxidation state can also generate a weak absorption film. Chromium with a purity of more than 98% has been reported to be made into rectangular targets or cylindrical chromium targets. In addition, the technology of using sintering method to make chromium rectangular target is also mature.
2. ITO target Preparation of ITO film target material used in the past, usually used In-Sn alloy materials to make targets, and then in the coating process through the oxygen, and then generate ITO film. This method is difficult to control the reaction gas and has poor reproducibility. Thus, in recent years has been replaced by ITO sintering target. ITO target material typical process is according to the quality ratio, through the ball milling method will be fully mixed, and then add the special organic powder composite agent will be mixed into the required shape, and through the pressurized compaction, and then the plate in the air at 100 ℃ / h heating rate to 1600 ℃ after holding 1h, and then cooling rate of 100 ℃ / h down to room temperature and made. Cooling rate of 100 ℃ / h down to room temperature and made. When making targets, the target plane is required to be polished, so as to avoid hot spots in the sputtering process.
3.Gold and gold alloy target gold, luster charming, with good corrosion resistance, is the ideal decorative surface coating materials. Wet plating method used in the past film adhesion is small, low strength, poor abrasion resistance, as well as waste liquid pollution problems, therefore, inevitably replaced by dry plating. The target type has plane target, local composite target, tubular target, local composite tubular target and so on. Its preparation method is mainly through the dosage of vacuum melting, pickling, cold rolling, annealing, fine rolling, shearing, surface cleaning, cold rolling composite package and a series of processes such as the preparation of the process. This technology has passed the appraisal in China, the use of good results.
4. Magnetic material target Magnetic material target is mainly used for plating thin film magnetic heads, thin film disks and other magnetic thin film devices. Due to the use of DC magnetron sputtering method for magnetic materials magnetron sputtering is more difficult. Therefore, CT targets with a so-called “gap target type” are used for the preparation of such targets. The principle is to cut out many gaps on the surface of the target material so that the magnetic system can be generated on the surface of the magnetic material target leakage magnetic field, so that the target surface can form an orthogonal magnetic field and achieve the purpose of magnetron sputtering film. It is said that the thickness of this target material can reach 20mm.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Jan-24-2024