With the increasing development of sputtering coating technology, especially magnetron sputtering coating technology, at present, for any material can be prepared by ion bombardment target film, because the target is sputtered in the process of coating it to some kind of substrate, the quality of sputtered film has an important impact, therefore, the requirements of the target material is also more stringent. In the selection of target material, in addition to the use of the film itself should be selected, should also consider the following issues:
1. The target material should have good mechanical strength and chemical stability after the formation of the film
2. Target and substrate combination must be strong, otherwise should be taken with the substrate has a good combination of membrane material, first sputtering a base film and then the preparation of the required membrane layer.
3 as a reaction sputtering membrane material must be easy to react with the gas to generate compounds membrane; 4.
4. Under the premise of meeting the requirements of membrane performance, the difference between the coefficient of thermal expansion of the target material and the substrate is as small as possible, so as to minimize the effect of thermal stress on the sputtered membrane.
The influence of thermal stress of sputtering film; 5.
5. According to the use and performance requirements of the membrane, the target material must meet the purity, impurity content, component uniformity, machining accuracy and other technical requirements.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Dec-21-2023