The vacuum coating machine process is divided into: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating.
1、Vacuum evaporation coating
Under the vacuum condition, make the material evaporated，such as the metal, metal alloy, etc. then deposit them on the substrate surface, the evaporation coating method is often use resistance heating, and then electron beam bombardment of the coating material, make them evaporated into gas phase, then deposit on the substrate surface, historically, vacuum vapor deposition is the earlier technology used in PVD method.
2、Sputtering coating
The gas is subjected to a glow discharge under (Ar)-filled vacuum conditionsAt this moment the argon (Ar) atoms ion into nitrogen ions (Ar), The ions are accelerated by the force of the electric field，and bombard the cathode target which is made of the coating material,the target will be sputtered out and deposited on the substrate surface Incident ions in sputter coating, generally obtained by glow discharge, are in the range of 10-2pa to 10Pa，So the sputtered particles are easy to collide with the gas molecules in the vacuum chamber when flying towards the substrate, making the motion direction random and the deposited film easy to be uniform.
3、Ion coating
Under the vacuum conditions, Under vacuum condition, Used a certain plasma ionisation technique to partially ionise the coating material atoms into ions.At the same time many high energy neutral atoms are produced ，which are negatively biased on the substrate.In this way, ions are deposited on the substrate surface under a deep negative bias to form a thin film.
Post time: Mar-23-2023