PVD coating is one of the main technologies for preparing thin film materials
The film layer endows the product surface with metal texture and rich color, improves wear resistance and corrosion resistance, and extends the service life.
Sputtering and vacuum evaporation are the two most mainstream PVD coating methods.
1、 Definition
Physical vapor deposition is a kind of physical vapor reaction growth method. The deposition process is carried out under vacuum or low pressure gas discharge conditions, that is, in low-temperature plasma.
The material source of the coating is solid material. After “evaporation or sputtering”, a new solid material coating completely different from the base material performance is generated on the surface of the part.
2、 Basic process of PVD coating
1. Emission of particles from raw materials (through evaporation, sublimation, sputtering and decomposition);
2. The particles are transported to the substrate (particles collide with each other, resulting in ionization, recombination, reaction, energy exchange and movement direction change);
3. The particles condense, nucleate, grow and form film on the substrate.
Post time: Jan-31-2023