Magnetron sputtering coating is carried out in glow discharge, with low discharge current density and low plasma density in the coating chamber. This makes magnetron sputtering technology have disadvantages such as low film substrate bonding force, low metal ionization rate, and low deposition rate. In the magnetron sputtering coating machine, an arc discharge device is added, which can use the high-density electron flow in the arc plasma generated by arc discharge to clean the workpiece, It can also participate in coating and auxiliary deposition.
Add an arc discharge power source in the magnetron sputtering coating machine, which can be a small arc source, a rectangular planar arc source, or a cylindrical cathode arc source. The high-density electron flow generated by the cathode arc source can play the following roles in the entire process of magnetron sputtering coating:
1. Clean the workpiece. Before coating, turn on the cathode arc source, etc., ionize the gas with arc electron flow, and clean the workpiece with low energy and high density argon ions.
2. The arc source and magnetic control target are coated together. When the magnetron sputtering target with glow discharge is activated for coating, the cathode arc source is also activated, and both coating sources are simultaneously coated. When the composition of the magnetron sputtering target material and the arc source target material is different, multiple layers of film can be plated, and the film layer deposited by the cathode arc source is a interlayer in the multi-layer film.
3. The cathode arc source provides high-density electron flow when participating in coating, increasing the probability of collision with the sputtered metal film layer atoms and reaction gases, improving the deposition rate, metal ionization rate, and playing a role in assisting deposition.
The cathode arc source configured in the magnetron sputtering coating machine integrates a cleaning source, coating source, and ionization source, playing a positive role in improving the quality of magnetron sputtering coating by utilizing the arc electron flow in the arc plasma.
Post time: Jun-21-2023