Fa'amatalaga fa'apitoa o masini fa'apipi'i fa'apipi'i masini fa'amalo

Vacuum magnetron sputtering e sili ona talafeagai mo faʻapipiʻi faʻafefe faʻafefe.O le mea moni, o lenei faiga e mafai ona teuina ni ata manifinifi o soʻo se oxide, carbide, ma mea nitride.E le gata i lea, o le faagasologa e sili ona fetaui lelei mo le faʻapipiʻiina o fausaga ata tifaga multilayer, e aofia ai mamanu faʻapipiʻi, ata lanu, faʻaofuofu faʻasaʻo, nano-laminates, superlattice coatings, insulating films, ma isi. fa'ata'ita'iga fa'aputuina ua fa'atupuina mo le tele o mea fa'apipi'i ata.O mea nei e aofia ai mea e faʻaalia manino, semiconductor, polymers, oxides, carbide, ma nitrides, aʻo faʻaaogaina fluoride i faiga e pei o le faʻafefeteina o le ufiufi.

O le aoga autu o le faʻaogaina o le magnetron sputtering process o loʻo faʻaogaina le faʻaogaina poʻo le le faʻaogaina o faiga faʻapipiʻi e teu ai faʻamau o nei mea ma pulea lelei le faʻaogaina o le faʻavae, mafiafia ata tifaga, tutusa mafiafia ata ma mea faʻainisinia o le layer.O le faagasologa e iai uiga e pei ona taua i lalo.

1, fua faatatau teuina tele.Ona o le faʻaaogaina o eletise magnetron maualuga, e mafai ona maua se tafe tele o le ion, faʻaleleia lelei le faʻaogaina o le faʻaogaina ma le sputtering fua o lenei faiga faʻapipiʻi.Pe a faʻatusatusa i isi faiga faʻapipiʻi faʻapipiʻiina, o le magnetron sputtering e maualuga lona gafatia ma maualuga le gaosiga, ma e faʻaaogaina lautele i gaosiga eseese o pisinisi.

2、Mana maualuga lelei.Magnetron sputtering target e masani lava ona filifili le voltage i totonu o le va o le 200V-1000V, e masani lava o le 600V, aua o le voltage o le 600V o loʻo i totonu o le maualuga maualuga o le malosi o le malosi.

3. Maualalo sputtering malosi.E fa'aogaina maualalo le voli fa'atatau o le magnetron, ma fa'agata ai e le fa'amaneta le plasma i tafatafa o le cathode, lea e taofia ai le maualuga atu o le malosi o vaega mai le lafoa'i i luga o le mea'ai.

4, Maulalo substrate vevela.E mafai ona faʻaaogaina le anode e taʻitaʻia ese ai le eletise na gaosia i le taimi o le faʻamalolo, e le manaʻomia le lagolago o le substrate e faʻamaeʻa, lea e mafai ona faʻaitiitia lelei ai le pomu eletise o le substrate.O le mea lea e maualalo ai le vevela o le substrate, lea e sili ona lelei mo nisi mea palasitika e le mafai ona teteʻe i le maualuga o le vevela.

5, Magnetron sputtering luga sini etching e le tutusa.Magnetron sputtering target surface etching le tutusa e mafua ona o le le tutusa maneta o le sini.O le nofoaga o le fua faatatau etching e sili atu, ina ia maualalo le fua faatatau aoga o le sini (na'o le 20-30% fua faatatau fa'aoga).O le mea lea, ina ia faʻaleleia le faʻaogaina o le faʻaogaina, e manaʻomia ona suia le tufatufaina o le mageta i nisi auala, poʻo le faʻaogaina o maneta o loʻo gaoioi i totonu o le cathode e mafai foi ona faʻaleleia le faʻaogaina o le faʻaogaina.

6, fa'atatau tu'ufa'atasi.E mafai ona faia tu'ufa'atasiga fa'apipi'i fa'apipi'i ata.I le taimi nei, o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻaogaina o le faʻagasologa o le sputtering faʻapipiʻiina i luga o le uʻamea Ta-Ti, (Tb-Dy) -Fe ma le Gb-Co faʻapipiʻi ata.O le fa'atulagaina o le fa'atulagaga fa'atatau e fa ituaiga, e ta'itasi, o le ta'amilosaga fa'apipi'i, fa'ailoga fa'atafafafafa, fa'asaga fa'atafafafafagu la'ititi ma le fa'amoemoe fa'apipi'i vaega.E sili atu le fa'aogaina o le vaega o lo'o fa'apipi'i fa'atatau.

7. Tele ituaiga o talosaga.Magnetron sputtering process e mafai ona teuina le tele o elemene, o mea masani e: Ag, Au, C, Co, Cu, Fe, Ge, Mo, Nb, Ni, Os, Cr, Pd, Pt, Re, Rh, Si, Ta, Ti , Zr, SiO, AlO, GaAs, U, W, SnO, ma isi.

Magnetron sputtering o se tasi lea o faiga faʻapipiʻi sili ona faʻaaogaina e maua ai ata maualuga.Faatasi ai ma se cathode fou, e maualuga le faʻaogaina o le faʻaogaina ma le maualuga o le faʻaogaina.Guangdong Zhenhua Tekonolosi vacuum magnetron sputtering faiga faʻapipiʻi ua faʻaaogaina nei i le faʻapipiʻiina o substrates vaega tele.O le faagasologa e le gata e faʻaaogaina mo le faʻapipiʻiina o ata tifaga tasi, ae faʻapea foʻi mo le faʻapipiʻiina o ata tifaga e tele, e le gata i lea, o loʻo faʻaaogaina foi i le lola e taʻavale ai le faagasologa mo le afifiina o ata tifaga, ata tifaga, lamination ma isi mea faʻapipiʻi ata.