Chemical Vapor Deposition (CVD) tekinoroji tekinoroji yekugadzira firimu inoshandisa kudziyisa, kuwedzera kweplasma, inobatsirwa nepikicha uye dzimwe nzira kugadzira zvinhu zvine gasi kugadzira mafirimu akasimba pane substrate pamusoro kuburikidza nemakemikari kuita pasi peyakajairika kana yakaderera kumanikidzwa.
Kazhinji, maitiro ekuti reactant iri gasi uye chimwe chezvigadzirwa chakasimba chinonzi CVD reaction.Kune akawanda marudzi emachira akagadzirirwa neCVD reaction, kunyanya mu semiconductor process.Semuenzaniso, mumunda we semiconductor, kucheneswa kwezvinhu zvakasvibirira, kugadzirira kwepamusoro-soro semiconductor single crystal films, uye kukura kwepolycrystalline uye amorphous mafirimu, kubva kune zvigadzirwa zvemagetsi kusvika kumatunhu akabatanidzwa, zvose zvine chokuita neCVD teknolojia.Pamusoro pezvo, kurapwa kwepamusoro kwezvinhu kunofarirwa nevanhu.Semuyenzaniso, zvinhu zvakasiyana-siyana zvakaita semichina, reactor, aerospace, zvekurapa uye zvemakemikari zvishandiso zvinogona kushandiswa kugadzirira machira anoshanda ane corrosion resistance, kupisa kupisa, kupfeka kuramba uye kusimbaradzwa kwepamusoro neCVD yekugadzira firimu nzira zvinoenderana nezvavanoda zvakasiyana.
—— Chinyorwa ichi chakatsikiswa naGuangdong Zhenhua, mugadziri wevacuum coating equipment
Nguva yekutumira: Mar-04-2023