Mamiriro ehunyanzvi evacuum magnetron sputtering coating equipment

Vacuum magnetron sputtering inonyanya kukodzera kune reactive deposition coatings.Muchokwadi, maitiro aya anogona kuisa mafirimu matete echero oxide, carbide, uye nitride zvinhu.Mukuwedzera, maitiro acho anonyanya kukodzera kuiswa kwemafirimu akawanda emufirimu, kusanganisira optical dhizaini, mafirimu emavara, kupfeka-resistant coatings, nano-laminates, superlattice coatings, insulating films, etc. Kare 1970, high quality optical film. deposition mienzaniso yakagadziridzwa kune akasiyana optical film layer zvinhu.Zvinhu izvi zvinosanganisira transparent conductive materials, semiconductors, polymers, oxides, carbides, uye nitrides, ukuwo fluorides inoshandiswa mukuita senge evaporative coating.

Mukana mukuru weiyo magnetron sputtering process ndeye kushandisa reactive kana isiri-reactive coating process kuisa zvidimbu zvezvinhu izvi uye kudzora zvakanaka kweiyo layer, ukobvu hwefirimu, kuenzana kwefirimu uye mashandiro emuchina weiyo layer.Iyo nzira ine maitiro anotevera.

1, Yakakura deposition rate.Nekuda kwekushandiswa kweakakwira-kumhanya magineti magineti, yakakura ion kuyerera inogona kuwanikwa, zvinobudirira kuvandudza deposition rate uye sputtering mwero weiyi coating process.Kuenzaniswa nemamwe maitiro ekuputira sputtering, magnetron sputtering ine hukuru hwepamusoro uye goho rakakura, uye inoshandiswa zvakanyanya mukugadzirwa kwakasiyana kwemaindasitiri.

2, Kushanda nesimba kwepamusoro.Magnetron sputtering target inowanzo sarudza voltage mukati me200V-1000V, kazhinji iri 600V, nekuti voltage ye600V inongori mukati meiyo yepamusoro inoshanda yemagetsi.

3. Low sputtering simba.Iyo magnetron target voltage inoiswa yakaderera, uye iyo magineti inovhara iyo plasma padyo necathode, iyo inodzivirira yakakwira simba rinochajiswa zvimedu kubva pakuvhurwa pane substrate.

4, Yakaderera substrate tembiricha.Iyo anode inogona kushandiswa kutungamira kure maerekitironi anogadzirwa panguva yekubuda, hapana chikonzero cherutsigiro che substrate kuti chipedze, icho chinogona kunyatso kudzikisa ma electron bombardment ye substrate.Saka iyo substrate tembiricha yakadzikira, iyo yakanakira mamwe epurasitiki substrates ayo asinganyatso kurwisa kupisa kwekushisa.

5, Magnetron sputtering target surface etching haisi yunifomu.Magnetron sputtering target surface etching kusaenzana kunokonzerwa nekusaenzana kwemagineti yechinangwa.Nzvimbo yechinangwa etching rate yakakura, kuitira kuti chiyero chekushandisa chinoshanda chechinangwa chakaderera (chete 20-30% chiyero chekushandisa).Naizvozvo, kuti uvandudze chinangwa chekushandiswa, iyo magineti yekugovera munda inoda kuchinjwa neimwe nzira, kana kushandisa magineti anofamba mu cathode anogona zvakare kugadzirisa chinangwa chekushandiswa.

6, Yakaumbwa chinangwa.Inogona kugadzira composite target coating alloy film.Parizvino, kushandiswa kwecomposite magnetron target sputtering process kwakanyatso kuputirwa paTa-Ti alloy, (Tb-Dy)-Fe uye Gb-Co alloy firimu.Chimiro chechinangwa chine marudzi mana, zvichiteerana, irwo rwakaiswa denderedzwa, mativi ane mativi akaiswa mativi, diki square inlaid target uye sector inlaid target.Iko kushandiswa kweiyo sector inlaid target structure kuri nani.

7. Yakasiyana-siyana yekushandisa.Magnetron sputtering process inogona kuisa zvinhu zvakawanda, zvakajairika ndezvi: Ag, Au, C, Co, Cu, Fe, Ge, Mo, Nb, Ni, Os, Cr, Pd, Pt, Re, Rh, Si, Ta, Ti. , Zr, SiO, AlO, GaAs, U, W, SnO, nezvimwewo.

Magnetron sputtering ndeimwe yeanonyanya kushandiswa ekubatisa maitiro kuti uwane emhando yepamusoro mafirimu.Iine cathode nyowani, ine yakakwira chinangwa chekushandisa uye yakakwira deposition rate.Guangdong Zhenhua Tekinoroji vacuum magnetron sputtering coating process yave kushandiswa zvakanyanya mukuputira enzvimbo dzakakura-nzvimbo substrates.Iyo nzira haingo shandiswe chete kune imwe-layer firimu deposition, asiwo kune akawanda-layer firimu coating, mukuwedzera, inoshandiswawo mumupumburu kukungurusa nzira yekurongedza firimu, optical firimu, lamination uye kumwe kupfekedza firimu.