No.1 Nheyo yesimba guru pulsed magnetron sputtering
Iyo yakakwira simba pulsed magnetron sputtering nzira inoshandisa yakakwirira peak pulse simba (2-3 maodha ehukuru akakwira kupfuura yakajairwa magnetron sputtering) uye yakaderera pulse duty cycle (0.5% -10%) kuwana yakakwirira simbi dissociation rates (> 50%), iyo inotorwa kubva kune magnetron sputtering maitiro, sezvakaratidzwa muPic 1, apo peak tarisiro yazvino density I inoenzanirana neexponential nth simba rekuburitsa voltage U, I = kUn (n inogara inoenderana necathode chimiro, magineti simba. uye zvinhu).Pamagetsi mashoma emagetsi (low voltage) kukosha kwen kunowanzova pakati pe5 kusvika ku15;nekuwedzera kwekubuda kwevoltage, ikozvino density uye simba density inowedzera nekukurumidza, uye pahigh voltage iyo n kukosha inova 1 nekuda kwekurasikirwa kwemagineti kuvharirwa.Kana pakaderera simba densities, kubuda gasi kunotarirwa negasi ions iri mune yakajairika pulsed discharge mode;kana pasimba resimba repamusoro, chikamu chesimbi ions muplasma chinowedzera uye zvimwe zvinhu zvinochinja, izvo zviri mu-self-sputtering mode, kureva kuti plasma inochengetwa neionization yezvimedu zvisina kwazvakarerekera uye yechipiri simbi ions, uye inert gasi maatomu. dzakadai seAr dzinoshandiswa chete kubatidza plasma, mushure mezvo zvimedu zvesimbi zvakapushwa zvinoiswa ion padhuze nevavariro uye zvinomhanyisa kudzoka kunobhomba chinangwa chakapushwa pasi pekuita kwemagineti nemagetsi minda kuchengetedza yakakwira ikozvino kubuda, uye plasma yakanyanya. ionized metal particles.Nekuda kweiyo sputtering maitiro ekudziya kwekuita pachinangwa, kuitira kuti ive nechokwadi chekushanda kwakagadzikana kwechinangwa mumaindasitiri ekushandisa, simba remagetsi rinoiswa zvakananga kune chinangwa hachigone kuve rakakura, kazhinji kutonhora kwemvura uye kutarisisa zvinhu zvinopisa kupisa. inofanira kunge iri 25 W / cm2 pazasi, kutonhora kwemvura isina kunanga, chinongedzo chekupisa conductivity chakashata, zvinhu zvinonangwa zvichikonzerwa nekutsemuka nekuda kwekushushikana kwekupisa kana zvinhu zvinonangwa zvine yakaderera volatile alloy zvikamu uye zvimwe zviitiko zvesimba density inogona kungove mukati. 2 ~ 15 W / cm2 pazasi, pazasi pezvinodiwa zvehukuru hwesimba.Dambudziko rechinangwa chekupisa rinogona kugadziriswa nekushandisa yakatetepa kwazvo high power pulses.Anders anotsanangura high-power pulsed magnetron sputtering serudzi rwekupuruzirwa uko simba repamusoro rinopfuura avhareji yesimba remagetsi ne2 kusvika ku3 maodha ehukuru, uye iyo inonangwa yekupuruzira inotonga maitiro ekupuruzira, uye chinangwa chekupfapfaidza maatomu akabatana zvakanyanya. .
No.2 Hunhu hwepamusoro simba pulsed magnetron sputtering coating deposition
High power pulsed magnetron sputtering inogona kuburitsa plasma ine high dissociation rate uye yakakwira ion simba, uye inogona kushandisa bias pressure kuti ikurumidze ions inochajwa, uye iyo coating deposition process inoputirwa neakakwira-simba zvidimbu, inova yakajairika IPVD tekinoroji.Iyo ion simba uye kugovera kune yakakosha mhedzisiro pamhando yekuputira uye kuita.
Nezve IPVD, zvichibva pane yakakurumbira Thorton dhizaini yedunhu modhi, Anders akakurudzira yakarongeka yedunhu modhi iyo inosanganisira plasma deposition uye ion etching, yakawedzera hukama pakati pekuvhara chimiro uye tembiricha uye kumanikidza kwemhepo muThorton dhizaini yedunhu modhi kune hukama pakati peiyo coating chimiro. tembiricha uye simba reion, sezvakaratidzwa muPic 2. Panyaya yeiyo yakaderera simba ion deposition coating, iyo yekupfekedza chimiro inoenderana neThorton chimiro zone modhi.Nekuwedzera kwekushisa kwekuisa, kushanduka kubva munharaunda 1 (yakasununguka porous fiber crystals) kuenda kunharaunda T (dense fiber crystals), nzvimbo 2 (columnar crystals) uye nharaunda 3 (recrystallization region);nekuwedzera kwesimba rekuisa ion, tembiricha yekushanduka kubva mudunhu 1 kuenda kudunhu T, dunhu 2 uye dunhu 3 inoderera.Iyo yakakwirira-density fiber makristasi uye columnar makristasi anogona kugadzirwa pakudziya kwakaderera.Kana simba remaion akaiswa rinowedzera kusvika pahurongwa hwe1-10 eV, kubhomba uye kuiswa kweiyoni panzvimbo yakavharirwa yejasi kunowedzerwa uye ukobvu hwemajasi hunowedzerwa.
No.3 Kugadzirira kweakaomesa coating layer nepamusoro simba pulsed magnetron sputtering tekinoroji
Iyo yekupfekedza inogadzirwa neakakwira simba pulsed magnetron sputtering tekinoroji yakaonda, ine zvirinani zvemuchina zvivakwa uye yakanyanya kugadzikana tembiricha.Sezvinoratidzwa muPic 3, iyo yakajairwa magnetron sputtered TiAlN coating is a columnar crystal structure ine kuoma kwe30 GPa uye Young's modulus ye460 GPa;iyo HIPMS-TiAlN coating ndeye 34 GPa kuoma uku iyo Yechidiki modulus iri 377 GPa;chiyero pakati pekuomarara neYoung's modulus chiyero chekuomarara kwejasi.Kuoma kwepamusoro uye kudiki modulus yeYoung zvinoreva kusimba kuri nani.Iyo HIPMS-TiAlN coating ine kugadzikana kwepamusoro tembiricha, ine AlN hexagonal nhanho inonaya mune yakajairwa TiAlN coating mushure mekupisa kwekushisa annealing kurapwa pa1,000 °C kwe4 h.Kuomarara kwejasi kunoderera pakupisa kwepamusoro, nepo HIPMS-TiAlN coating inoramba isina kuchinjika mushure mekupisa kupisa panguva imwechete yekupisa uye nguva.HIPMS-TiAlN coating zvakare ine yakakwirira yekutanga tembiricha yekupisa tembiricha oxidation pane yakajairwa coating.Naizvozvo, iyo HIPMS-TiAlN coating inoratidza kuita zvirinani mu-high-speed yekucheka maturusi pane mamwe maturusi akavharidzirwa akagadzirwa nePVD maitiro.
Nguva yekutumira: Nov-08-2022