1、Zvimiro zve sputter coating
Kuenzaniswa neyakajairwa vacuum evaporation coating, sputtering coating ine zvinotevera maficha:
(1) Chero chinhu chinogona kusapurwa, kunyanya kunyungudika kwakakwira, yakaderera mhute yekumanikidza zvinhu uye makomisheni.Chero bedzi iine yakasimba, ingave simbi, semiconductor, insulator, musanganiswa uye musanganiswa, nezvimwewo, ingave iri block, granular material inogona kushandiswa sechinhu chinotarirwa.Sezvo kushomeka kudiki uye kupatsanurwa kunoitika kana sputtering insulating zvinhu uye alloys senge okisidhi, anogona kushandiswa kugadzira akatetepa mafirimu uye alloy mafirimu ane mayunifomu akafanana neaya echinhu chakanangwa, uye kunyange superconducting mafirimu ane yakaoma nziyo. iyo reactive sputtering method inogonawo kushandiswa kugadzira mafirimu emakemikari akasiyana zvachose kubva kune zvakanangwa zvinhu, senge okisijeni, nitrides, carbides uye silicides.
(2) Kubatana kwakanaka pakati pefirimu yakasvibiswa uye substrate.Sezvo simba remaatomu akapfapfaidzwa ari 1-2 maodha ehukuru akakwira kupfuura emaatomu akaputika, kushandurwa kwesimba rezvikamu zvine simba guru rakaiswa pasubstrate rinoburitsa simba repamusoro rinopisa, rinowedzera kunamira kwemaatomu akapfapfaidza kune substrate.Chikamu chemaatomu akapushwa ane simba guru achabayiwa kune madhigirii akasiyana, achigadzira iyo inonzi pseudo-diffusion layer pane substrate apo maatomu akapushwa uye maatomu eiyo substrate material "miscible" pamwe chete.Pamusoro pezvo, panguva yekubhomba kwezvimedu zvinoputika, iyo substrate inogara ichicheneswa uye ichiitwa munzvimbo yeplasma, inobvisa maatomu anonaya asina kubatwa zvakanaka, inonatsa uye inoita kuti pasi pevhu.Nekuda kweizvozvo, kunamatira kweiyo sputtered firimu layer kune substrate kunowedzera zvakanyanya.
(3) High density ye sputter coating, shoma pinholes, uye yakakwirira kuchena kwefirimu layer nekuti hapana crucible contamination, iyo isingadzivisike muvacuum vapor deposition panguva yekuputira sputter process.
(4) Kudzora kwakanaka uye kudzokororwa kwemafirimu ukobvu.Sezvo kubuda kwezvino uye chinangwa chazvino chinogona kudzorwa zvakasiyana panguva yekuputira sputter, ukobvu hwefirimu hunogona kudzorwa nekudzora chinangwa chazvino, nekudaro, kudzoreka kweiyo firimu ukobvu uye kudzokororwa kweiyo firimu ukobvu nekupopota kwakawanda kwe sputter coating kwakanaka. , uye iyo firimu yezvakafanotemerwa ukobvu inogona kunyatsovharwa.Mukuwedzera, sputter coating inogona kuwana yunifomu yefirimu ukobvu panzvimbo yakakura.Nekudaro, kune general sputter coating tekinoroji (kunyanya dipole sputtering), michina yakaoma uye inoda yakanyanya kudzvanywa mudziyo;iyo firimu yekugadzira kukurumidza kwe sputter deposition yakaderera, iyo vacuum evaporation deposition rate ndeye 0.1 ~ 5nm / min, nepo sputtering rate iri 0.01 ~ 0.5nm / min;iyo substrate tembiricha inokwira yakakwira uye inotapukirwa negasi retsvina, nezvimwewo. Zvisinei, nekuda kwekuvandudzwa kweRF sputtering uye magnetron sputtering tekinoroji, kufambira mberi kukuru kwakawanikwa mukuwana kukurumidza kuputika kwekuisa uye kuderedza substrate tembiricha.Uyezve, mumakore achangopfuura, nzira itsva dzekuputira sputter dziri kuongororwa - zvichibva pane planar magnetron sputtering - kuderedza sputtering air pressure kusvika zero-pressure sputtering apo kudzvinyirirwa kwegasi rekudya panguva yekuputira kunenge kwave zero.
Nguva yekutumira: Nov-08-2022