Itekhnoloji ye-Chemical Vapor Deposition (CVD) yitekhnoloji yokwenza ifilimu esebenzisa ukufudumeza, ukuphuculwa kweplasma, ukuncediswa kwefoto kunye nezinye iindlela zokwenza izinto ezinegesi zivelise iifilimu eziqinileyo kumphezulu we-substrate ngokusabela kweekhemikhali phantsi koxinzelelo oluqhelekileyo okanye oluphantsi.
Ngokubanzi, ukusabela apho i-reactant yigesi kwaye enye yeemveliso iqinile ibizwa ngokuba yi-CVD reaction.Kukho iintlobo ezininzi zeengubo ezilungiselelwe yi-CVD reaction, ngakumbi kwinkqubo ye-semiconductor.Ngokomzekelo, kwintsimi ye-semiconductor, ukucocwa kwezinto eziluhlaza, ukulungiswa kweefilimu eziphezulu ze-semiconductor enye ye-crystal, kunye nokukhula kweefilimu ze-polycrystalline kunye ne-amorphous, ukusuka kwizixhobo zombane ukuya kwiisekethe ezidibeneyo, zonke zihambelana nobuchwepheshe be-CVD.Ukongeza, ukunyangwa komphezulu wezinto eziphathekayo kuthandwa ngabantu.Ngokomzekelo, izinto ezahlukeneyo ezifana noomatshini, i-reactor, i-aerospace, izixhobo zonyango kunye neekhemikhali zingasetyenziselwa ukulungiselela iingubo ezisebenzayo kunye nokumelana nokugqwala, ukuxhathisa ukushisa, ukuxhatshazwa kokugqoka kunye nokuqiniswa komphezulu nge-CVD indlela yokwenza ifilimu ngokweemfuno zabo ezahlukeneyo.
—— Eli nqaku lipapashwe ngu Guangdong Zhenhua, umenzi weizixhobo zokugquma ivacuum
Ixesha lokuposa: Mar-04-2023