Inkqubo yoMthombo we-Ion oNcinane we-Arc

Inkqubo yecathodic arc source ion ukutyabeka ngokusisiseko iyafana nezinye iitekhnoloji zokugquma, kwaye eminye imisebenzi efana nokufakela izixhobo zokusebenza kunye nokucoca ayisaphindwa.

1.Ukucocwa kwebhombu yezixhobo zokusebenza

Ngaphambi kokugubungela, igesi ye-argon ifakwe kwigumbi lokugubungela kunye ne-vacuum ye-2 × 10-2Pa.

Vula i-pulse bias power supply, kunye nomjikelezo womsebenzi we-20% kunye ne-workpiece bias ye-800-1000V.

Xa amandla e-arc evuliwe, ukukhutshwa kokukhanya kwe-arc kwintsimi ebandayo kwenziwa, ekhupha inani elikhulu le-electron yangoku kunye ne-titanium ion yangoku ukusuka kumthombo we-arc, okwenza i-plasma ephezulu.I-ion ye-titanium ikhawulezisa i-injection yayo kwi-workpiece phantsi koxinzelelo olubi oluphezulu lwe-bias olusetyenzisiweyo kwi-workpiece, ibhobhobhobho kunye nokutshiza i-gas eseleyo kunye nezingcolisi ezibhengezwa kumphezulu we-workpiece, kunye nokucoca kunye nokucoca umphezulu we-workpiece;Ngelo xesha, igesi yeklorini kwigumbi lokugquma i-ionized ngama-electron, kwaye i-argon ions ikhawuleza ibhomu yendawo yokusebenza.

Ngoko ke, umphumo wokucoca i-bombardment ulungile.Kuphela malunga nomzuzu we-1 wokucoca ibhomba unokucoca i-workpiece, ebizwa ngokuba yi "main arc bombardment".Ngenxa yobuninzi be-titanium ion, ukuba umthombo omncinci we-arc usetyenziselwa ukubhobhoza kunye nokucoca i-workpiece ixesha elide, ubushushu bomsebenzi owenziweyo buxhomekeke ekugqithiseni, kwaye umphetho wesixhobo unokuthamba.Kwimveliso jikelele, imithombo ye-arc encinci ivuliwe enye ukusuka phezulu ukuya phezulu, kwaye umthombo ngamnye we-arc omncinci unexesha lokucoca i-bombardment malunga ne-1 ngomzuzu.

(1) Ukugquma umaleko we-titanium ezantsi

Ukuze kuphuculwe ukunamathela phakathi kwefilimu kunye ne-substrate, umaleko we-titanium substrate ecocekileyo idla ngokugqunywa ngaphambi kokugquma i-titanium nitride.Lungisa inqanaba le-vacuum ukuya kwi-5 × 10-2-3 × 10-1Pa, lungisa i-voltage ye-workpiece bias kwi-400-500V, kwaye ulungelelanise umjikelo womsebenzi we-pulse bias power supply ukuya kuma-40% ~ 50%.Isalayita imithombo encinci ye-arc nganye nganye ukuvelisa ukukhutshwa kwe-arcing kwintsimi ebandayo.Ngenxa yokuhla kwamandla ombane ongalunganga we-bias workpiece, amandla e-titanium ion ayancipha.Emva kokufikelela kwi-workpiece, i-sputtering effect ingaphantsi kwe-deposition effect, kwaye i-titanium transition layer yenziwe kwi-workpiece ukuphucula amandla okudibanisa phakathi kwe-titanium nitride hard film layer kunye ne-substrate.Le nkqubo ikwayinkqubo yokufudumeza i-workpiece.Xa ithagethi ye-titanium ecocekileyo ikhutshwa, ukukhanya kwiplasma kuluhlaza okwesibhakabhaka.

I-1.I-ammoniated isitya sokugquma ifilimu enzima

Lungisa idigri yevacuum ukuya kwi-3 × 10^-1-5Pa, lungisa i-voltage ye-bias ye-workpiece kwi-100-200V, kwaye ulungelelanise umjikelo womsebenzi we-pulse bias power supply ukuya kwi-70% ~ 80%.Emva kokuba i-nitrogen ingenisiwe, i-titanium yindibaniselwano yokusabela kunye ne-arc discharge plasma yokufaka ifilimu eqinileyo ye-titanium nitride.Ngeli xesha, ukukhanya kweplasma kwigumbi lokucoca i-cherry ebomvu.Ukuba uC₂H₂O₂, njl. ziyaziswa, TiCN, TiO₂, njl. Iingqimba zefilimu zinokufumaneka.

-Eli nqaku likhutshwe nguGuangdong Zhenhua, aumenzi womatshini wokugquma