Izixhobo ezidibeneyo zokugquma i-magnetron sputtering kunye ne-cathodic multi-arc ion coating inokusebenza ngokwahlukileyo kwaye ngaxeshanye;inokufakwa kwaye ilungiswe ifilimu yesinyithi ecocekileyo, ifilimu edibeneyo yesinyithi okanye ifilimu edibeneyo;inokuba ngumaleko omnye wefilimu kunye nefilimu ehlanganisiweyo yamanqanaba amaninzi.
Iinzuzo zayo ngolu hlobo lulandelayo:
Ayidibanisi nje kuphela iingenelo zokwaleka kwe-ion ezahlukeneyo kwaye ithathela ingqalelo ukulungiswa kunye nokubekwa kwefilimu ebhityileyo kwiinkalo ezahlukeneyo zesicelo, kodwa ikwavumela ukubekwa kunye nokulungiswa kweefilimu ezinomaleko amaninzi okanye iifilimu ezihlanganisiweyo zamaleko amaninzi kwindawo enye. igumbi lokulala ngexesha elinye.
Ukusetyenziswa kweemaleko zefilimu ezidiphozithiweyo zisetyenziswa ngokubanzi itekhnoloji yayo ikwiindlela ezahlukeneyo, eziqheleke ngolu hlobo lulandelayo:
(1) Ikhompawundi ye-non-equilibrium magnetron sputtering kunye ne-cathodic ion plating technology.
Isixhobo sayo siboniswe ngolu hlobo lulandelayo.Sisixhobo sokugquma sekhompiyutha ekujoliswe kuyo yi-columnar magnetron kunye neplani yecathodic arc ion coating, efanelekileyo kuzo zombini izixhobo zokugquma ifilimu kunye nefilimu yokuhombisa.Ukufakwa kwesixhobo, i-cathodic arc ion coating isetyenziswa kuqala kwi-coat layer yesiseko, kwaye ke i-target yekholamu ye-magnetron isetyenziselwa ukubekwa kwe-nitride kunye nezinye iileya zefilimu ukufumana ifilimu ephezulu yokuchaneka kwesixhobo sokucoca.
Ukugubungela ukuhlobisa, iifilimu zokuhlobisa i-TiN kunye ne-ZrN zinokufakwa kwi-cathodic arc coating kuqala, kwaye emva koko i-doped ngesinyithi usebenzisa iithagethi zemagnetron, kwaye umphumo we-doping ulungile kakhulu.
(2) Ikhompawundi yemagnetron yeplane kunye nekholamu yecathode arc ion ubuchule bokugquma.Isixhobo siboniswa ngolu hlobo lulandelayo.Isetyenziselwa iteknoloji ekujoliswe kuyo iwele eliphambili, xa iithagethi ezimbini zecala necala ezidityaniswe kunikezelo lwamandla ombane ophakathi, ayikoyisi nje kuphela ityhefu ekujoliswe kuyo ye-DC sputtering, umlilo kunye nezinye iingxaki;kwaye ingafaka i-Al203, i-SiO2 ifilimu esemgangathweni ye-oxide, ukwenzela ukuba ukuxhathisa kwe-oxidation yeendawo ezigqunyiweyo ziye zanda kwaye ziphuculwe.I-Columnar multi-arc target ifakwe embindini wegumbi lokucoca, into ekujoliswe kuyo ingasetyenziselwa i-Ti kunye ne-Zr, kungekhona nje ukugcina inzuzo yezinga eliphezulu le-arc multi-arc dissociation, izinga lokubeka, kodwa inokunciphisa ngokufanelekileyo "amathontsi" inkqubo ye-plane encinci i-multi-arc target deposition, inokufaka idiphozithi kwaye ilungiselele i-porosity ephantsi yeefilimu zetsimbi, iifilimu ezihlanganisiweyo.Ukuba i-Al kunye ne-Si zisetyenziswa njengezinto ezijoliswe kuzo kwiithagethi ze-magnetron ezicwangcisiweyo ezifakwe kwi-periphery, i-Al203 okanye i-Si0 ifilimu ze-metal-ceramic zingafakwa kwaye zilungiswe.Ukongeza, iindiza ezincinci ezininzi zomthombo we-arc evaporation zingafakwa kwi-periphery, kwaye izinto ezijolise kuzo zingaba yiCr okanye i-Ni, kunye neefilimu zetsimbi kunye neefilimu ezihlanganisiweyo ezininzi zinokufakwa kwaye zilungiswe.Ngoko ke, le teknoloji yokudibanisa itekhnoloji yitekhnoloji yokwambathisa edibeneyo enezicelo ezininzi.
Ixesha lokuposa: Nov-08-2022