Ubuchwepheshe beChemical Vapor Deposition (CVD) ubuchwepheshe bokwenza ifilimu obusebenzisa ukushisa, ukuthuthukiswa kwe-plasma, okusizwa isithombe nezinye izindlela zokwenza izinto ezinegesi zikhiqize amafilimu aqinile endaweni engaphansi komhlaba ngokusebenzisa ukusabela kwamakhemikhali ngaphansi kwengcindezi evamile noma ephansi.
Ngokuvamile, ukusabela lapho i-reactant iyigesi futhi omunye wemikhiqizo uqinile kubizwa ngokuthi i-CVD reaction.Kunezinhlobo eziningi zokumboza ezilungiselelwe ukusabela kwe-CVD, ikakhulukazi kunqubo ye-semiconductor.Isibonelo, emkhakheni we-semiconductor, ukucwengwa kwezinto zokusetshenziswa, ukulungiswa kwefilimu ye-crystal eyodwa ye-semiconductor yekhwalithi ephezulu, nokukhula kwamafilimu e-polycrystalline ne-amorphous, kusukela kumishini kagesi kuya kumasekethe ahlanganisiwe, konke kuhlobene nobuchwepheshe be-CVD.Ngaphezu kwalokho, ukwelashwa okungaphezulu kwezinto kuthandwa ngabantu.Isibonelo, izinto ezihlukahlukene ezifana nemishini, i-reactor, i-aerospace, imishini yezokwelapha kanye namakhemikhali ingasetshenziswa ukulungisa izembatho ezisebenzayo ezinokumelana nokugqwala, ukumelana nokushisa, ukumelana nokugqoka kanye nokuqiniswa kwendawo ngendlela yokwenza ifilimu ye-CVD ngokuvumelana nezidingo zabo ezahlukene.
—— Le ndatshana ishicilelwe nguGuangdong Zhenhua, umkhiqizi weimishini yokufaka i-vacuum
Isikhathi sokuthumela: Mar-04-2023