Ukwethulwa kokufakwa kwe-vacuum vapor, i-sputtering kanye ne-ion coating

I-vacuum coating ikakhulukazi ihlanganisa ukufakwa komhwamuko we-vacuum, i-sputtering coating kanye ne-ion coating, konke okusetshenziselwa ukufaka amafilimu ahlukahlukene ensimbi nangewona awensimbi ebusweni bezingxenye zepulasitiki ngokukhipha izihluzi noma ngokufafaza ngaphansi kwezimo ze-vacuum, ezingathola ukumbozwa kwendawo encane kakhulu. ngenzuzo evelele yokunamathela okusheshayo, kodwa intengo nayo iphakeme, futhi izinhlobo zezinsimbi ezingase zisetshenziswe zincane, futhi ngokuvamile zisetshenziselwa ukugqoka okusebenzayo kwemikhiqizo yezinga eliphezulu.

I-vacuum vapor deposition yindlela yokushisisa insimbi ngaphansi kwe-vacuum ephezulu, iyenze inyibilike, ihwamuke, futhi yakhe ifilimu yensimbi encane ebusweni besampula ngemva kokupholisa, enogqinsi luka-0.8-1.2 um.Igcwalisa ingxenye encane ye-concave kanye ne-convex ebusweni bomkhiqizo owenziwe ukuze ithole indawo efana nesibuko.Lapho ukufakwa komhwamuko we-vacuum kwenziwa ukuze kutholwe umphumela wesibuko esikhanyayo noma ukushamisa insimbi ngokunamathela okuphansi, indawo engaphansi. kumele zimbozwe.

I-sputtering ngokuvamile ibhekisela ku-magnetron sputtering, okuyindlela ye-sputtering enezinga eliphezulu elinesivinini esiphansi.Inqubo idinga i-vacuum engaba ngu-1×10-3Torr, okuyisimo se-vacuum esingu-1.3×10-3Pa esigcwaliswe nge-inert gas argon (Ar), naphakathi kwe-plastic substrate (anode) kanye nethagethi yensimbi (cathode) kanye ne-high-voltage. amandla aqondile, ngenxa yesasasa le-electron yegesi engasebenzi ekhiqizwe ukukhishwa okukhanyayo, ekhiqiza i-plasma, i-plasma izoqhumisa ama-athomu ethagethi yensimbi futhi iwabeke ku-substrate yepulasitiki.Iningi lezingubo zensimbi ezijwayelekile zisebenzisa i-DC sputtering, kuyilapho izinto zobumba ezingaqhubeki zisebenzisa i-RF AC sputtering.

Ukugcotshwa kwe-ion kuyindlela lapho ukuchithwa kwegesi kusetshenziswa khona ukwenza igesi ibe ionini kancane noma into ehwamukile ngaphansi kwezimo ze-vacuum, futhi into ehwamukile noma izinto ezisabela ngayo kuzo zifakwa ku-substrate ngokuqhunyiswa kwama-ion wegesi noma ama-ion wento ehwamukile.Lokhu kufaka i-ion coating ye-magnetron sputtering, i-ion esebenzayo, i-ion yokukhipha i-cathode engenalutho (indlela yokubeka umphunga we-cathode ongenalutho), kanye ne-multi-arc ion coating (i-cathode arc ion coating).

I-magnetron emile emaceleni ekabili ephafaza inamathela eqhubekayo emgqeni
Ukusebenza okubanzi, kungasetshenziselwa imikhiqizo ye-elekthronikhi efana nesendlalelo sokuvikela igobolondo le-EMI, imikhiqizo eyisicaba, kanye nayo yonke imikhiqizo yenkomishi yesibani ngaphakathi kokucaciswa okuthile kobude ingakhiqizwa.Umthamo omkhulu wokulayisha, ukugoqa okuhlangene kanye nokubambeneka okugxaza kwezinkomishi ezikhanyayo zokwemboza okunezinhlangothi ezimbili, okungaba nomthamo omkhulu wokulayisha.Ikhwalithi ezinzile, ukungaguquguquki okuhle kwesendlalelo sefilimu kusuka kunqwaba kuya kunqwaba.Izinga eliphakeme lokuzenzakalelayo kanye nezindleko eziphansi zokusebenza zokusebenza.