Izici zobuchwepheshe ze-vacuum magnetron sputtering coating equipment

I-vacuum magnetron sputtering ifaneleka ngokukhethekile kuma-reactive deposition coatings.Eqinisweni, le nqubo ingafaka amafilimu amancane anoma iyiphi i-oxide, i-carbide, nezinto ze-nitride.Ngaphezu kwalokho, le nqubo ibuye ifaneleke ngokukhethekile ukufakwa kwezakhiwo zefilimu ye-multilayer, okuhlanganisa imiklamo ye-optical, amafilimu emibala, izintambo ezingagqoki, ama-nano-laminates, ama-superlattice coatings, amafilimu avikelayo, njll. Ekuqaleni kuka-1970, ifilimu yokukhanya yekhwalithi ephezulu. izibonelo zokubeka zenzelwe izinto ezihlukahlukene zesendlalelo sefilimu ye-optical.Lezi zinto zifaka izinto ezibonisa izinto zokuqhuba izinto, ama-semiconductors, ama-polymer, ama-oxides, ama-carbides, nama-nitrides, kuyilapho ama-fluoride esetshenziswa ezinqubweni ezifana nokufaka ukuhwamuka.

Inzuzo eyinhloko yenqubo ye-magnetron sputtering isebenzisa izinqubo zokuhlanganisa ezisebenzayo noma ezingezona ezisebenzayo ukufaka izingqimba zalezi zinto kanye nokulawula kahle ukwakheka kongqimba, ukushuba kwefilimu, ukufana kwefilimu kanye nezakhiwo zemishini zesendlalelo.Inqubo inezimpawu ezilandelayo.

1. Inani elikhulu lokufakwa.Ngenxa yokusetshenziswa kwama-electrode we-magnetron anesivinini esikhulu, ukugeleza kwe-ion enkulu kungatholakala, ukuthuthukisa ngokuphumelelayo izinga lokubeka kanye nezinga lokufafaza le nqubo yokumboza.Uma kuqhathaniswa nezinye izinqubo zokugcoba ama-sputtering, i-magnetron sputtering inomthamo ophezulu kanye nesivuno esikhulu, futhi isetshenziswa kabanzi ekukhiqizeni izimboni ezihlukahlukene.

2. Ukusebenza kahle kwamandla aphezulu.Ithagethi ye-Magnetron sputtering ngokuvamile ikhetha i-voltage engaphakathi kwebanga elingu-200V-1000V, imvamisa iba ngu-600V, ngenxa yokuthi i-voltage engu-600V ingaphakathi kwebanga eliphakeme kakhulu elisebenza kahle lamandla.

3. Amandla okuphalaza aphansi.I-voltage ehlosiwe ye-magnetron isetshenziswa iphansi, futhi insimu kazibuthe ivalela i-plasma eduze kwe-cathode, evimbela izinhlayiya eziphezulu ezishajwa amandla ukuthi zingene ku-substrate.

4, Izinga lokushisa eliphansi le-substrate.I-anode ingasetshenziswa ukuqondisa kude ama-electron akhiqizwa ngesikhathi sokukhishwa, asikho isidingo sokuthi ukusekelwa kwe-substrate kuqedwe, okunganciphisa ngempumelelo ukuqhuma kwe-electron ye-substrate.Ngakho-ke izinga lokushisa le-substrate liphansi, elilungele kakhulu amanye ama-substrates epulasitiki angamelani kakhulu nokushisa okuphezulu.

5, I-Magnetron sputtering target surface etching ayifani.I-Magnetron sputtering target surface etching ukungalingani kubangelwa indawo kazibuthe engalingani yethagethi.Indawo yezinga lokunamathisela okuhlosiwe inkulu, ukuze izinga lokusebenzisa elisebenzayo lethagethi libe liphansi (izinga lokusebenzisa elingu-20-30% kuphela).Ngakho-ke, ukuze kuthuthukiswe ukusetshenziswa okuhlosiwe, ukusatshalaliswa kwendawo kazibuthe kudinga ukushintshwa ngezindlela ezithile, noma ukusetshenziswa kozibuthe abahamba ku-cathode nakho kungathuthukisa ukusetshenziswa okuhlosiwe.

6, Ithagethi ehlanganisiwe.Ingenza ifilimu eyingxube yethagethi enamathelayo.Njengamanje, ukusetshenziswa kwenqubo ye-composite magnetron target sputtering kuhlanganiswe ngempumelelo ku-Ta-Ti alloy, (Tb-Dy)-Fe kanye nefilimu ye-Gb-Co alloy.Isakhiwo sethagethi esiyinhlanganisela sinezinhlobo ezine, ngokulandelana, okuyithagethi ehlanganisiwe eyindilinga, ithagethi ehlanganisiwe eyisikwele, ithagethi ehlanganisiwe eyisikwele esincane kanye nethagethi ehlanganisiwe yomkhakha.Ukusetshenziswa kwesakhiwo esihlosiwe somkhakha kungcono.

7. Uhlu olubanzi lwezinhlelo zokusebenza.Inqubo ye-Magnetron sputtering ingafaka izakhi eziningi, ezivamile yilezi: Ag, Au, C, Co, Cu, Fe, Ge, Mo, Nb, Ni, Os, Cr, Pd, Pt, Re, Rh, Si, Ta, Ti , Zr, SiO, AlO, GaAs, U, W, SnO, njll.

I-Magnetron sputtering ingenye yezinqubo zokumboza ezisetshenziswa kakhulu ukuthola amafilimu ekhwalithi ephezulu.Nge-cathode entsha, inokusetshenziswa okuhlosiwe okuphezulu kanye nezinga eliphezulu lokubeka.I-Guangdong Zhenhua Technology vacuum magnetron sputtering coating process manje isisetshenziswa kabanzi ekwembathweni kwama-substrates asendaweni enkulu.Le nqubo ayisetshenziselwa kuphela ukufakwa kwefilimu ye-single-layer, kodwa futhi ne-multi-layer film coating, ngaphezu kwalokho, iphinde isetshenziselwe inqubo yomqulu wokugoqa ifilimu yokupakisha, ifilimu ye-optical, i-lamination nokunye ukugqoka ifilimu.